1.

Conference Proceedings
Conference Proceedings
1. High-performance Integration of Copper Interconnects with Low-k Hydrogen Silsesquioxane Employing Deuterium Plasma Treatment
Liu, P.-T. ; Chang, T.-C. ; Yang, Y.L. ; Cheng, Y.F. ; Lee, J.K. ; Shih, F.Y. ; Tsai, E. ; Chen, G. ; Sze, S.M.
Pub. info.: Interconnect and contact metallization for ULSI : proceedings of the international symposium.  pp.251-260,  1999.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-31
2.

Conference Proceedings
Conference Proceedings
2. Design of an acoustic wave actuator using Lorentz force
Liu, P.-T. ; Ho, Y.-P. ; Shen, S.-H. ; Tang, S.-T. ; Young, S.-T. ; Fang, W.
Pub. info.: Design, characterization, and packaging for MEMS and microelectronics II : 17-19 December, 2001, Adelaide, Australia.  pp.109-118,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4593
3.

Conference Proceedings
Conference Proceedings
3. Enhancement of Organic Low-k Hybrid-Organic-SiloXane-Polymer (HOSP) in Resisting Oxygen Plasma Process
Chang, T.-C. ; Liu, P.-T. ; Su, H. ; Chang, C.-F. ; Yang, Y.-L. ; Sze, S.M. ; Hou, J. ; Chung, H.
Pub. info.: Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium.  pp.72-89,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-5
4.

Conference Proceedings
Conference Proceedings
4. Improvement in the Characteristics of Post-CMP Low-k Methylsilsesquioxane(MSQ)
Chrang, T.-C. ; Liu, P.-T. ; Huang, M.-C. ; Tsai, T.-M. ; Hsu, K.-C. ; Yang, Y.-L. ; Sze, S.M. ; Chung, H. ; Hou, J.
Pub. info.: Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium.  pp.114-132,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-5
5.

Conference Proceedings
Conference Proceedings
5. Ammonia Plasma Passivation Effects on Properties of Post-CMP Low-k Hydrogen Silsesquioxane (HSQ)
Chang, T.-C. ; Liu, P.-T. ; Tsai, T.-M. ; Chang, C.-F. ; Yang, Y.-L. ; Sze, S.M. ; Shih, F.Y. ; Tsai, E. ; Chen, G. ; Lee, J.K.
Pub. info.: Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium.  pp.133-143,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-5