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12 results

Conference Proceedings

1. Full-chip lithography manufacturability check for yield improvement [6156-33]

Huang, Y. ; Tseng, E. ; Lin, B. S.-M ; Yu, C. C. ; Wang, C.-W. ; Liu, H.-Y.

Pub. info.:	Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA. pp.61560W-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6156

Conference Proceedings

2. Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Driessen, F.A. ; van Adrichem, P. ; Philipsen, V. ; Jonckheere, R. ; Liu, H.-Y. ; Karklin, L.

Pub. info.:	Optical Microlithography XV. Part Two pp.1180-1189, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

3. NONDESTRUCTIVE COMPOSITIONAL AND DEFECT CHARACTERIZATION OF CdZnTe ALLOYS USING PHOTOLUMINESCENCE SPECTROSCOPY

Duncan, W.M. ; Koestner, R.J. ; Tregilgas, J.H. ; Liu, H.-Y. ; Chen, M.-C.

Pub. info.:	Properties of II-VI semiconductors : bulk crystals, epitaxial films, quantum well structures, and dilute magnetic systems : symposium held November 27-December 2, 1989, Boston, Massachusetts, U.S.A.. pp.39-44, 1990. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	161

Conference Proceedings

4. Implementing AAPSM in 90-nm product with practical image imbalance correction

Lin, B.S. ; Hsu, S.- ; Huang, I.H. ; Chen, K. ; Hsieh, F. ; Hsu, T. ; Liu, H.-Y. ; Kroyan, A. ; Hsu, F. ; Huang, J.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.103-111, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

5. Practical approach for AAPSM image imbalance correction for sub-100-nm lithography

Cho, H.L. ; Lin, S.Y. ; Hsieh, F. ; Kroyan, A. ; Liu, H.-Y. ; Huang, J.H. ; Hsu, S.-H. ; Huang, I-H. ; Lin, B.S.-M. ; Hung, K.-C.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.778-786, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. Effects of alternating aperture PSM design on image imbalance for 65-nm technology

Kroyan, A. ; Liu, H.-Y.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1217-1226, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

7. Extending ArF to the 65-nm node with full-phase lithography

Driessen, F.A. ; Pierrat, C. ; Vandenberghe, G. ; Ronse, K.G. ; Adrichem, P. ; Liu, H.-Y.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1091-1102, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

8. Limits of strong phase-shift patterning for device research

Fritze, M. ; Mallen, R.D. ; Wheeler, B. ; Yost, D. ; Snyder, J.P. ; Kasprowicz, B.S. ; Eynon, B.G. ; Liu, H.-Y.

Pub. info.:	Optical Microlithography XVI. Part One pp.327-343, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

9. Image-blur tolerances for 65-nm and 45-nm node IC manufacturing

Lalovic, I. ; Kroyan, A. ; Kye, J. ; Liu, H.-Y. ; Levinson, H.J.

Pub. info.:	Optical Microlithography XVI. Part Three pp.1570-1580, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

10.

Conference Proceedings

10. Growth and characterization of multiple layer quantum dot lasers (Invited Paper)

Smowton, P.M. ; Walker, C.L. ; Sandall, l.C. ; Sellers, l.R. ; Mowbray, D.J. ; Liu, H.-Y. ; Gutierrez, M. ; Hopkinson, M.

Pub. info.:	Novel In-Plane Semiconductor Lasers IV. pp.332-346, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5738

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Author: Liu, H.-Y.