1.

Conference Proceedings
Conference Proceedings
1. Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node
Driessen, F.A. ; van Adrichem, P. ; Philipsen, V. ; Jonckheere, R. ; Liu, H.-Y. ; Karklin, L.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1180-1189,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. MBE-grown 1.3 micron InGaAsN/GaAs double QW VCSELs with very low-threshold current density under room temperature CW operation
Lai, C.-M. ; Wang, J.-S. ; Hsiao, R.-S. ; Wei, L.-C. ; Lin, G. ; Lin, K.-F. ; Liu, H.-Y. ; Kovsh, A.R. ; Maleev, N.N. ; Livshits, D.A. ; Chen, J.-F. ; Chi, J.-Y.
Pub. info.: Semiconductor Lasers and Laser Dynamics.  pp.312-322,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5452
3.

Conference Proceedings
Conference Proceedings
3. Image-blur tolerances for 65-nm and 45-nm node IC manufacturing
Lalovic, I. ; Kroyan, A. ; Kye, J. ; Liu, H.-Y. ; Levinson, H.J.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1570-1580,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Limits of strong phase-shift patterning for device research
Fritze, M. ; Mallen, R.D. ; Wheeler, B. ; Yost, D. ; Snyder, J.P. ; Kasprowicz, B.S. ; Eynon, B.G. ; Liu, H.-Y.
Pub. info.: Optical Microlithography XVI.  Part One  pp.327-343,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Extending ArF to the 65-nm node with full-phase lithography
Driessen, F.A. ; Pierrat, C. ; Vandenberghe, G. ; Ronse, K.G. ; Adrichem, P. ; Liu, H.-Y.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1091-1102,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Effects of alternating aperture PSM design on image imbalance for 65-nm technology
Kroyan, A. ; Liu, H.-Y.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1217-1226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
7.

Conference Proceedings
Conference Proceedings
7. Implementing AAPSM in 90-nm product with practical image imbalance correction
Lin, B.S. ; Hsu, S.- ; Huang, I.H. ; Chen, K. ; Hsieh, F. ; Hsu, T. ; Liu, H.-Y. ; Kroyan, A. ; Hsu, F. ; Huang, J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.103-111,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
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Conference Proceedings
Conference Proceedings
8. NONDESTRUCTIVE COMPOSITIONAL AND DEFECT CHARACTERIZATION OF CdZnTe ALLOYS USING PHOTOLUMINESCENCE SPECTROSCOPY
Duncan, W.M. ; Koestner, R.J. ; Tregilgas, J.H. ; Liu, H.-Y. ; Chen, M.-C.
Pub. info.: Properties of II-VI semiconductors : bulk crystals, epitaxial films, quantum well structures, and dilute magnetic systems : symposium held November 27-December 2, 1989, Boston, Massachusetts, U.S.A..  pp.39-44,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 161
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Conference Proceedings
Conference Proceedings
9. DEPTH SENSITIVE IMAGING OF DEFECS IN EPILAYERS AND SINGLE CRYSTALS USING WHITE BEAM SYNCHROTRON RADIATION TOPOGRAPHY IN GRAZING BRAGG-LAUE GEOMETRY
Dudley, M. ; Yao, G.-D. ; Wu, J. ; Liu, H.-Y.
Pub. info.: Impurities, defects, and diffusion in semiconductors : bulk and layered structures : symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A..  pp.1031-1036,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 163
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Conference Proceedings
Conference Proceedings
10. Growth and characterization of multiple layer quantum dot lasers (Invited Paper)
Smowton, P.M. ; Walker, C.L. ; Sandall, l.C. ; Sellers, l.R. ; Mowbray, D.J. ; Liu, H.-Y. ; Gutierrez, M. ; Hopkinson, M.
Pub. info.: Novel In-Plane Semiconductor Lasers IV.  pp.332-346,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5738