1.

Conference Proceedings
Conference Proceedings
1. Characterization of CD control for sub-0.18-ｦﾌm lithographic patterning
Sturtevant,J.L. ; Allgair,J. ; Fu,C.-C. ; Green,K.G. ; Hershey,R.R. ; Kling,M.E. ; Litt,L.C. ; Lucas,K.D. ; Roman,B.J. ; Seligman,C.S. ; Schippers,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.220-227,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Cost analysis of 4X and 6X 9-in.reticles for future lithography
Litt,L.C. ; Kling,M.E. ; Perkinson,T.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.243-254,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Manufacturing considerations for implementation of scatterometry for process monitoring
Allgair,J. ; Benoit,D.C. ; Hershey,R.R. ; Litt,L.C. ; Abdulhalim,I.S. ; Braymer,B. ; Faeyrman,M. ; Robinson,J.C. ; Whitney,U.K. ; Xu,Y. ; Zalicki,P. ; Seligson,J.L.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.125-134,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
4.

Conference Proceedings
Conference Proceedings
4. Development of an i-line attenuated phase shift process for dual inlay interconnect lithography
Sturtevant,J.L. ; Ho,B.C.P. ; Geiszler,V.C. ; Herrick,M.T. ; King,C.F. ; Carter,R.L. ; Roman,B.J. ; Litt,L.C. ; Smith,B. ; Strozewski,K.J.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.505-512,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Impact of flare on CD variation for 248- and 193-nm lithography systems
Bourov,A. ; Litt,L.C. ; Zavyalova,L.
Pub. info.: Optical Microlithography XIV.  4346  pp.1388-1393,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization
Allgair,J.A. ; Benoit,D.C. ; Drew,M. ; Hershey,R.R. ; Litt,L.C. ; Herrera,P.P. ; Whitney,U.K. ; Guevremont,M. ; Levy,A. ; Lakkapragada,S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.462-471,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
7.

Conference Proceedings
Conference Proceedings
7. Full-field CD control for sub-0.20-ｦﾌm patterning
Sturtevant,J.L. ; Allgair,J. ; Barrick,M.W. ; Fu,C. ; Green,K.G. ; Hershey,R.R. ; Litt,L.C. ; Maltabes,J.G. ; Nelson,C. ; Roman,B.J. ; Singelyn,J.
Pub. info.: Optical Microlithography X.  pp.137-145,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051