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Conference Proceedings

1. Acid diffusion in a chemically amplified negative i-line photoresist

Connolly,J. ; Chen,K.R. ; Kwong,R.W. ; Lawson,M. ; Linehan,L.L. ; Moreau,W.M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.1124-1131, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

2. Polymer-bound sensitizer in i-line resist formulations

Jagannathan,P. ; DeWan,C. ; Eckert,A.R. ; Mih,R.D. ; Martinek,K. ; Richwine,C. ; Linehan,L.L. ; Moreau,W.M. ; Smith,R.S.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.1258-1270, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333