Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

15 results

Conference Proceedings

1. Fixed Oxide Charge in Ru-based Chemical Vapour Deposited High-K Gate Stacks

Frohlich, K. ; Luptak, R. ; Tapajna, M. ; Husekova, K. ; Weber, U. ; Baumann, P. K. ; Lindner, J.

Pub. info.:	Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices. pp.277-287, 2006. Dordrecht. Springer
Title of ser.:	NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.:	220

Conference Proceedings

2. Growth of Al2O3 Films by Pulsed Injection MOCVD: Comparative Study of Precursor Materials

Abrutis, A. ; Bartasyte, A. ; Kubilius, V. ; Teiserskis, A. ; Baumann, P. ; Lindner, J. ; Schumacher, M. ; Dubourdieu, C.

Pub. info.:	Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium. pp.771-776, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-8

Conference Proceedings

3. Deposition of BaTiO3 Layers by Injection MOCVD

Weiss, F. ; Lindner, J. ; Senateur, J.-P. ; Ploss, B. ; Hubert-Pfalzgraf, L. ; Daniele, S.

Pub. info.:	Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11. pp.1013-1019, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-25

Conference Proceedings

4. 25 Atomic Vapor Deposition of Ru and RuO2 Thin Film Layers for Metal Gate Applications

Manke, C. ; Boissiere, O. ; Baumann, P. ; Lindner, J. ; Schumacher, M.

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.207-214, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-05

Conference Proceedings

5. 40 Properties of Ru/HfxSi1_xOy/Si MOS Gate Stack Structures grown by MOCVD

Frohlich, K. ; Luptak, R. ; Husekova, K. ; Cico, K. ; Tapajna, M. ; Weber, U. ; Baumann, P.K. ; Lindner, J.

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.339-346, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-05

Conference Proceedings

6. 34 Improving CMOS performance by AVD〓 grown high-k dielectrics and advanced metal electrodes

Weber, U. ; Boissiere, O. ; Lindner, J. ; Schumacher, M. ; Lehnen, P. ; Manke, C. ; Van Elshocht, S. ; Caymax, M. ; Cosnier, V. ; McEntee, T.

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.293-300, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-05

Conference Proceedings

7. Microreactors for Ionic Reactions in Liquids and Gels in Electric Field

Snita, D. ; Lindner, J. ; Sevcinkova, H. ; Kosek, J. ; Marek, M.

Pub. info.:	AIChE ANNUAL MEETING - MARCH 8-12, 1998 - NEW ORLEANS, LA. 1998. New York. American Institute of Chemical Engineers
Title of ser.:	AIChE meeting [papers]
Ser. no.:	1998

Conference Proceedings

8. SrTiO3/BaTiO3 Artificial Superlattices Obtained by Injection MOCVD

Lindner, J. ; Weiss, F. ; Haessler, W. ; Kobernik, G. ; Senateur, J-P. ; Oswald, S. ; Santiso, J. ; Figueras, A.

Pub. info.:	Ferroelectric thin films VII : symposium held November 30-December 3, 1998, Boston, Massachusetts, U.S.A.. pp.501-, 1999. Warrendale, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	541

Conference Proceedings

9. Structural characterization using synchrotron radiation of oxide films and multilayers grown by MOCVD

Dubourdieu, C. ; Lindner, J. ; Audier, M. ; Rosina, M. ; Weiss, F. ; Senateur, J. P. ; Hodeau, J. L. ; Dooryhee, E. ; Berar, J. F.

Pub. info.:	Applications of synchrotron radiation techniques to materials science V : sympoisum held November 29-December 3, 1999, Boston, Massachusetts, U.S.A.. pp.219-, 2000. Warrendale, Pa.. MRS-Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	590

10.

Conference Proceedings

10. MOCVD growth and properties of high-k dielectric praseodymium oxides layers on silicon

Abrutis, A. ; Lukosius, M. ; Kiziene, A. ; Baumann, P. K. ; Schumacher, M. ; Lindner, J.

Pub. info.:	EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium. pp.936-943, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-09

15 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by:

Author: Lindner, J.