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36 results

Conference Proceedings

1. Morphological boundary detecting method in cineangiogram image

Feng,G. ; Lin,Q.

Pub. info.:	International Workshop on Photonics and Imaging in Biology and Medicine : 8-10 October 2001, Wuhan, China. pp.44-48, 2001. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4536

Conference Proceedings

2. Extension of 248-nm optical lithography: a thin film imaging approach

Lin,Q. ; Katnani,A.D. ; Brunner,T.A. ; DeWan,C. ; Fairchok,C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Seeger,D.E. ; Angelopoulos,M. ; Soonyakumaran,R. ; Wallraff,G.M. ; Hofer,D.C.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.278-288, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Top-surface imaging through silylation

Postnikov,S.V. ; Somervell,M.H. ; Henderson,C.L. ; Katz,S. ; Willson,C.G. ; Byers,J.D. ; Qin,A. ; Lin,Q.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.997-1008, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

4. Positive- and negative-tone water-processable photoresists: a progress report

Yamada,S. ; Medeiros,D.R. ; Patterson,K. ; Jen,W.-L.K. ; Rager,T. ; Lin,Q. ; Lenci,C. ; Byers,J.D. ; Havard,J.M. ; Pasini,D. ; Frechet,J.M.J. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.245-253, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

5. Positive bilayer resists for 248-and 193-nm lithography

Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.219-227, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

6. Effects of underlayer on performance of bilayer resists for 248-nm lithography

Babich,K. ; Callegari,A. ; Petrillo,K.E. ; Simons,J.P. ; LaTulipe,D.C.,Jr. ; Angelopoulos,M. ; Lin,Q.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.726-734, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

7. Color FM screen design using DBS algorithm

Lin,Q. ; Allebach,J.P.

Pub. info.:	Color imaging : device-independent color, color hardcopy, and graphic arts III : 28-30 January 1998, San Jose, California. pp.353-361, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3300

Conference Proceedings

8. Effects of crosslinking agent on lithographic performance of negative-tone resists based on poly(p-hydroxystyrene)

Lin,Q. ; Katnani,A.D. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.974-987, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

9. Two kinds of new beam lasers

Wnag,S. ; Zhu,J. ; Lu,X. ; Lin,Q. ; Zhao,D.

Pub. info.:	Laser processing of materials and industrial applications II : 16-19 September 1998, Beijing, China. pp.516-520, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3550

10.

Conference Proceedings

10. Novel organic electroluminescent device using a new Eu3+ polymer as emitting laser

Chen,J. ; Liu,X. ; Fan,X. ; Lin,Q. ; Gu,P. ; Tang,J.

Pub. info.:	Advanced photonic sensors : Technology and applications, 8-10 Novenber 2000, Beijing, China. pp.255-259, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4220

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