1.

Conference Proceedings
Conference Proceedings
1. 0.13-ｦﾌm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks
Chen,Y.T. ; Lin,C.H. ; Lin,H.T. ; Hsieh,H.C. ; Yu,S.S. ; Yen,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.99-110,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Sub-0.18-ｦﾌm line/space lithography using 248-nm scanners and assisting feature OPC masks
Lin,H.T. ; Lin,J.C.H. ; Chiu,C.S.G. ; Wang,Y.Y. ; Yen,A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.307-315,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873