1.

Conference Proceedings
Conference Proceedings
1. Improvement of OPC accuracy for 65nm node contact using KIF [6155-22]
Wu, T. H. ; Lin, C. L. ; Chen, M. J. ; Tsai, Z. H. ; Ao, C. Y. ; Thung, H. C. ; Liou, J. S. ; Yang, C. H. ; Lin, L. C.
Pub. info.: Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA.  pp.61550M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6155
2.

Conference Proceedings
Conference Proceedings
2. Study of 157nm resists with full field exposure tools
Hsu, R. H. ; Huang, I. H. ; Lin, L. C. ; Lin, B. S.-M.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.572-583,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
3.

Conference Proceedings
Conference Proceedings
3. 32nm node technology development using interference immersion lithography
Wu, T. H. ; Lin, L. C. ; Lin, C. L.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.491-501,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
4.

Conference Proceedings
Conference Proceedings
4. Novel illumination apertures for resotution-enhanced technology and through-pitch critical dimension control
Huang, I.-H. ; Lin, L. C. ; Lin, C. L.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1395-1404,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754