Lin, 0. ; Hung, R. ; Lee, B. ; Wu, Y.-H. ; Kozuma, M. ; Shih, C.-L. ; Lin, J. ; Hsu, M. ; Hsu, S. D.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.835-843, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Chang, Y. Y. ; Wu, Y.-H. ; Shih, C.-L. ; Lin, J. ; Kan, F. ; Lin, J.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.757-766, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lin, J. ; Chen, W. ; Banerjee, S. ; Lee, J. ; Teng, C. ; Magee, C.
Pub. info.:
Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A.. pp.623-628, 1992. Pittsburgh, Pa.. Materials Research Society
Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A.. pp.163-168, 1992. Pittsburgh, Pa.. Materials Research Society
Wu, B. ; Bai, J. ; Tassev,, V. L. ; Lal Nakarmi M. ; Sun, W. ; Huang, X. ; Dudley, M. ; Zhang, H. ; Bliss, D. F. ; Lin, J. ; Jiang, H. ; Yang, J. ; Asif Kahn, M.
Pub. info.:
GaN, AlN, InN and related materials : symposium held November 28-December 2, 2005, Boston, Massachusetts, U.S.A.. pp.653-658, 2006. Warrendale, Pa.. Materials Research Society