1.

Conference Proceedings
Conference Proceedings
1. High thermal stable and low resistance contacts to p-GaN for thin -GaN LED [5941-56]
Lin, C. L. ; Wang, S. J. ; Liu, C. Y.
Pub. info.: Fifth international conference on solid state lighting : 1-4 August 2005, San Diego, California, USA.  pp.59411M-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5941
2.

Conference Proceedings
Conference Proceedings
2. Improvement of OPC accuracy for 65nm node contact using KIF [6155-22]
Wu, T. H. ; Lin, C. L. ; Chen, M. J. ; Tsai, Z. H. ; Ao, C. Y. ; Thung, H. C. ; Liou, J. S. ; Yang, C. H. ; Lin, L. C.
Pub. info.: Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA.  pp.61550M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6155
3.

Conference Proceedings
Conference Proceedings
3. Analysis of precise CD control for 45nm node and beyond
Cheng, Y. F. ; Wu, T. H. ; Lin, C. L. ; Chang, S. Y. ; Lin, B.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.204-214,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. FULLERENE SUPERCONDUCTORS: EFFECTS OF MOLECULAR ORIENTATION AND VALENCE
Yildirim, T. ; Barbedette, L. ; Kniaz, M. ; Fischer, J. E. ; Lin, C. L. ; Bykovetz, N. ; Stephens, P. W. ; Sulewski, P. E. ; Erwin, S. C.
Pub. info.: Science and technology of fullerene materials : Symposium held November 28-December 2, 1994.  pp.273-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 359
5.

Conference Proceedings
Conference Proceedings
5. 32nm node technology development using interference immersion lithography
Wu, T. H. ; Lin, L. C. ; Lin, C. L.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.491-501,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
6.

Conference Proceedings
Conference Proceedings
6. Structural and electricat properties of high-K Al2O3-ZrO2 gate dielectrics on SOI substrate
Ding, Y. F. ; Ye, G. S. ; Zhang, N. L. ; Zhu, M. ; Lin, C. L. ; Zhu, Z. Q.
Pub. info.: Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China.  pp.646-650,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5774
7.

Conference Proceedings
Conference Proceedings
7. Novel illumination apertures for resotution-enhanced technology and through-pitch critical dimension control
Huang, I.-H. ; Lin, L. C. ; Lin, C. L.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1395-1404,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
8.

Conference Proceedings
Conference Proceedings
8. The Effect of Terminal Ligands on the Dimensionality and Topology of Metal Dicarboxylate Coordination Structures
Pan, Long ; Ching, Nancy ; Huang, Xiaoying ; Lee, Jeongyong ; Li, Jing ; Yuen, Tan ; Lin, C. L. ; Zan, Jason
Pub. info.: Solid-state chemistry of inorganic materials V : symposium held November 29-December 2, 2004, Boston, Massachusetts, U.S.A..  pp.145-150,  2005.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 848
9.

Conference Proceedings
Conference Proceedings
9. Study of effects of sidewall angle on process window using 193nm CPL masks in a 300mm wafer manufacturing environment [5992-92]
Cheng, Y. F. ; Chou, Y. L. ; Lin, C. L. ; Huang, P.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922R-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992