Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

11 results

Conference Proceedings

1. Lithographic comparison of assist feature design strategies

Mansfield,S.M. ; Liebmann,L.W. ; Molless,A.F. ; Wong,A.K.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.63-76, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Lithographic effects of mask critical dimension error

Wong,A.K. ; Ferguson,R.A. ; Liebmann,L.W. ; Mansfield,S.M. ; Molless,A.F. ; Neisser,M.O.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.106-116, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

3. High-resolution ultraviolet defect inspection of DAP(darkfield alternate phase)reticles

Liebmann,L.W. ; Mansfield,S.M. ; Wong,A.K. ; Smolinski,J.G. ; Peng,S. ; Kimmel,K.R. ; Rudzinski,M.W. ; Wiley,J.N. ; Zurbrick,L.S.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.148-161, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. Alternating phase-shifted mask for logic gate levels,design,and mask manufacturing

Liebmann,L.W. ; Graur,I.C. ; Leipold,W.C. ; Oberschmidt,J.M. ; O'Grady,D.S. ; Regaill,D.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.27-37, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

5. Asymmetric biasing for subgrid pattern adjustment

Wong,A.K. ; Liebmann,L.W.

Pub. info.:	Optical Microlithography XIV. 4346 pp.1548-1553, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

6. Characterization of linewidth variation on 248- and 193-nm exposure tools

Gabor,A.H. ; Brunner,T.A. ; Chen,J. ; Chen,N. ; Deshpande,S. ; Ferguson,R.A. ; Horak,D.V. ; Holmes,S.J. ; Liebmann,L.W. ; Mansfield,S.M. ; Molless,A.F. ; Progler,C.J. ; Rabidoux,P.A. ; Ryan,D. ; Talvi,P. ; Tsou,L. ; Vampatella,B.R. ; Wong,A.K. ; Yang,Q. ; Yu,C.

Pub. info.:	Optical Microlithography XIV. 4346 pp.259-264, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

7. Optimizing style options for subresolution assist features

Liebmann,L.W. ; Bruce,J.A. ; Chu,W. ; Cross,M. ; Graur,I.C. ; Krueger,J.J. ; Leipold,W.C. ; Mansfield,S.M. ; McGuire,A.E. ; Sundling,D.L.

Pub. info.:	Optical Microlithography XIV. 4346 pp.141-152, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

8. Alternating phase-shifting mask with reduced aberration sensitivity: lithography considerations

Wong,A.K. ; Liebmann,L.W. ; Molless,A.F.

Pub. info.:	Optical Microlithography XIV. 4346 pp.420-428, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. Resolution enhancement techniques in optical lithography: It's not just a mask problem

Liebmann,L.W.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.23-32, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

10.

Conference Proceedings

10. Method to determine printability of photomask defects and its use in phase-shift mask evaluations

Mansfield,S.M. ; Ferguson,R.A. ; Liebmann,L.W. ; Molless,A.F. ; Wong,A.K.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.651-660, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

11 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by:

Author: Liebmann,L.W.