1.

Conference Proceedings
Conference Proceedings
1. Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC
Roy, S. ; Van Den Broeke, D.J. ; Chen, J.F. ; Liebchen, A. ; Chen, T. ; Hsu, S.D. ; Shi, X. ; Socha, R.J.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.190-201,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
2.

Conference Proceedings
Conference Proceedings
2. Investigation of model OPC optimization based on CD uniformity yield
Roy, S. ; Chen, J.F. ; Liebchen, A. ; Laidig, T.L. ; Wampler, K.E. ; Hollerbach, U.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.810-816,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. Hopkins versus Abbe: a lithography simulation matching study
Schlief, R.E. ; Liebchen, A. ; Chen, J.F.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1106-1117,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Resist model calibration using 2D developed patterns for low-k1 process optimization and wafer printing predictions
Chen, T. ; Van Den Broeke, D. ; Park, S. ; Liebchen, A. ; Chen, J. F. ; Hsu, S. ; Park, J. C. ; Yu, L. ; Gronlund, K.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.434-444,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. Impact on OPC treatment accuracy due to illumination pupil shape deviation for 110-nm target CD
Roy, S. ; Schlief, R.E. ; Hsu, S. ; Shi, X. ; Liebchen, A. ; Chen, J.F. ; Hansen, S.G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.876-883,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
6.

Conference Proceedings
Conference Proceedings
6. Implementation of pattern-specific illumination pupil optimization on Step & Scan systems
Engelen, A. ; Socha, R.J. ; Hendrickx, E. ; Scheepers, W. ; Nowak, F. ; Van Dam, M. ; Liebchen, A. ; Faas, D.A.
Pub. info.: Optical Microlithography XVII.  pp.1323-1333,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377