1.

Conference Proceedings
Conference Proceedings
1. Study of the influence of substrate topography on the focusing performance of advanced lithography scanners
Fontaine, B.M.L. ; Hauschild, J. ; Dusa, M.V. ; Acheta, A. ; Apelgren, E.M. ; Boonman, M. ; Krist, J. ; Khathuria, A. ; Levinson, H.J. ; Fumar-Pici, A. ; Pieters, M.
Pub. info.: Optical Microlithography XVI.  Part One  pp.570-581,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Flare and its impact on low-k1 KrF and ArF lithography
La Fontaine, B. ; Dusa, M.V. ; Acheta, A. ; Chen, C. ; Bourov, A. ; Levinson, H.J. ; Litt, L.C. ; Mulder, M. ; Seltman, R. ; van Praagh, J.
Pub. info.: Optical Microlithography XV.  Part One  pp.44-56,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Image-blur tolerances for 65-nm and 45-nm node IC manufacturing
Lalovic, I. ; Kroyan, A. ; Kye, J. ; Liu, H.-Y. ; Levinson, H.J.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1570-1580,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging
Deng, Y. ; Fontaine, B.M.L. ; Levinson, H.J. ; Neureuther, A.R.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.302-313,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
5.

Conference Proceedings
Conference Proceedings
5. Spherical aberration measurement and in-situ correction
Acheta, A. ; Kye, J. ; Levinson, H.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1474-1479,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Influence of antireflection coatings in ArF lithography
La Fontaine, B.M. ; Pawloski, A.R. ; Acheta, A. ; Deng, Y. ; Levinson, H.J. ; Spence, C. ; Chovino, C. ; Dieu, L. ; Johnstone, E. ; Kalk, F.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.995-1005,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
7.

Conference Proceedings
Conference Proceedings
7. EUV mask making: an approach based on the direct patterning of the EUV reflector
Chovino, C. ; Dieu, L. ; Johnstone, E. ; Reyes, J. ; La Fontaine, B.M. ; Levinson, H.J. ; Pawloski, A.R.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.566-572,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors
La Fontaine, B. ; Pawloski, A.R. ; Deng, Y. ; Chovino, C. ; Dieu, L. ; Wood, O.R., II ; Levinson, H.J.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.300-310,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
9.

Conference Proceedings
Conference Proceedings
9. Metrology requirements for lithography's next wave
Levinson, H.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1-9,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
10.

Conference Proceedings
Conference Proceedings
10. Characterization of line-edge roughness in photoresist using an image fading technique
Pawloski, A.R. ; Acheta, A. ; Lalovic, I. ; Fontaine, B.M.L. ; Levinson, H.J.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.414-425,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376