1.

Conference Proceedings
Conference Proceedings
1. 2 Pattern effects during spike annealing of ultra-shallow implants
Niess, J. ; Ndnyei, Z. ; Lerch, W. ; Paul, S.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.11-16,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
2.

Conference Proceedings
Conference Proceedings
2. 9 Structure and thermal evolution of small clusters found after ultralow-energy high-dose boron implantation in Si
Hebras, X. ; Cristiano, F. ; Cherkash, N. ; Lerch, W. ; Paul, S. ; Pawlalr, B. ; Surdeano, R. ; Claverie, A.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.67-82,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
3.

Conference Proceedings
Conference Proceedings
3. 6 Rapid thermal solid phase epitaxy annealing for ultra-shallow junction formation
Lerch, W. ; Paul, S. ; Downey, D. F. ; Arevalo, E. A.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.43-50,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
4.

Conference Proceedings
Conference Proceedings
4. Solid Phase Epitaxy- Activation and Deactivation of Boron in Ultra-Shallow Junctions
Lerch, W. ; Paul, S. ; Niess, J. ; Crisliano, F. ; Lamrani, Y. ; Colvo, P. ; Cherkashin, N. ; Downey, D.F. ; Arevalo, E.A.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.90-105,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
5.

Conference Proceedings
Conference Proceedings
5. * Analysis of Pinmark Induced Defects after RTP
Niess, J. ; Dietl, W. ; Altug, O. ; Lerch, W. ; Geiler, H.D. ; Karge, H.
Pub. info.: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.79-86,  2001.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-9
6.

Conference Proceedings
Conference Proceedings
6. State of the Art Techniques for Ultra-Shallow Junction Formation
Lerch, W. ; Bayha, B. ; Downey, D.F. ; Arevalo, E.
Pub. info.: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.321-336,  2001.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-9
7.

Conference Proceedings
Conference Proceedings
7. Modelling of the Surface Annihilation of Excess Self-Interstitials Generated by Gold Diffusion into Silicon
Stolwijk, N. A. ; Lerch, W. ; Giese, A.
Pub. info.: Semiconductor process and device performance modeling : symposium held December 2-3, 1997, Boston, Massachusetts, U.S.A..  pp.111-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 490
8.

Conference Proceedings
Conference Proceedings
8. Simulation of Rapid Thermal Annealed Boron Ultrashallow Junctions in Inert and Oxidizing Ambient
Lerch, W. ; Gluck, M. ; Stolwijk, N. A. ; Walk, H. ; Schafer, M. ; Marcus, S. D. ; Downey, D. F. ; Chow, J. W. ; Marquardt, H.
Pub. info.: Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.237-,  1998.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 525
9.

Conference Proceedings
Conference Proceedings
9. Experimental study on the mechanism of carbon diffusion in silicon
Cowern, N.E.B. ; Colombeau, B. ; Roozeboom, F. ; Hopstaken, M. ; Snijders, H. ; Meunier-Beillard, P. ; Lerch, W.
Pub. info.: Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A..  pp.255-262,  2002.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 717