1.

Conference Proceedings
Conference Proceedings
1. 57 Atomic Vapor Deposition of complex high-k thin films for sub-90 nm CMOS devices
Lindnc, J. ; Miedl, S. ; Schumacher, H. ; Lehnen, P. ; Weber, U. ; Boumoon, P.K. ; MeEntee, T.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.459-464,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
2.

Conference Proceedings
Conference Proceedings
2. 34 Improving CMOS performance by AVD〓 grown high-k dielectrics and advanced metal electrodes
Weber, U. ; Boissiere, O. ; Lindner, J. ; Schumacher, M. ; Lehnen, P. ; Manke, C. ; Van Elshocht, S. ; Caymax, M. ; Cosnier, V. ; McEntee, T.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.293-300,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
3.

Conference Proceedings
Conference Proceedings
3. Atomic Vapor Deposition (AVDTM) process for High Performance HfO2 Dielectric Layers
Cosnier, V. ; Dabertrand, K. ; Blonkowski, S. ; Lhostis, S. ; Zoll, S. ; Morand, Y. ; Descombes, S. ; Guillaumot, B. ; Hobbs, C. ; Rochat, N. ; Rolland, G. ; Renault, O. ; Garros, X. ; Casse, M. ; Mitard, J. ; Lehnen, P. ; Miedl, S. ; Lindner, J. ; Schumacher, M.
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811