1.

Conference Proceedings
Conference Proceedings
1. Optimization of ARC process in DUV lithography
Shim,K.-J. ; Choi,B.-I. ; Park,K.-Y. ; Lee,W.-G.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.692-701,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Reduction of wafer-scale error between DI and FI in multilevel metallization hy adjusting edge detedion method
Bae,S.-G. ; Kim,Y.-K. ; Park,K.-Y. ; Kim,J.-S. ; Lee,W.-G. ; Lee,S.-W. ; Lee,D.-H.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.460-469,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
3.

Conference Proceedings
Conference Proceedings
3. Process optimization by reducing I-D bias for 0.25-ｦﾌm logic devices
Park,K.-Y. ; Choi,B.-I. ; Lee,W.-G. ; Ko,C.-G.
Pub. info.: Optical Microlithography X.  pp.170-181,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
4.

Conference Proceedings
Conference Proceedings
4. Characteristics of overlay accuracy after metal CMP process
Kim,Y.-K. ; Lee,Y.-S. ; Lee,W.-G. ; Ko,C.-G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.270-281,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050