1.

Conference Proceedings
Conference Proceedings
1. Enhanced capability improvement using OPC pattern generation in laser lithography
Lee,I.-S. ; Nam,K.-H. ; Kim,L.-J. ; Shin,C. ; Kim,H.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.212-220,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
2.

Conference Proceedings
Conference Proceedings
2. Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography
Nam,K.-H. ; Kim,L.-J. ; Jeong,H.-S. ; Lee,S.-W. ; Lee,I.-S. ; Shin,C. ; Kim,H.-S. ; Dieu,L. ; Paek,S.W. ; Koo,S.-S. ; Bae,S.-M. ; Ham,Y.-M. ; Shin,K.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.70-80,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
3.

Conference Proceedings
Conference Proceedings
3. Efficiency analysis of mask fabrication with 1-Gb-DRAM storage node layer
Han,O. ; Kim,B.-C. ; Park,H.-B. ; Lee,I.-S.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.419-424,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884