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10 results

Conference Proceedings

1. ArF photoresist containing novel acid labile cross-linker for high contrast and PED stability

Lee,G. ; Koh,C.-W. ; Hong,S.-E. ; Jung,J.-C. ; Jung,M.-H. ; Kim,H.-S. ; Baik,K.-H.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.13-22, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

2. Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists

Hong,S.-E. ; Jung,M.-H. ; Jung,J.-C. ; Lee,G. ; Kim,J.-S. ; Koh,C.-W. ; Baik,K.-H.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.966-973, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

3. Two-dimensional wavelet-packet-based feature selection method for image recognition

Kim,M. ; Baek,J. ; Kim,S. ; Lee,G.

Pub. info.:	Document recognition and retrieval VIII : 24-25 January, 2001, San Jose, [California] USA. pp.307-314, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4307

Conference Proceedings

4. Regularized dequantizers for DCT-based transform coding of images

Lee,G. ; Kim,S. ; Song,S.M.-H.

Pub. info.:	Visual communications and image processing 2001 : 24-26 January, 2001, San Jose, USA. pp.830-837, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4310

Conference Proceedings

5. Are the color gamuts of CRT and LCD triangular? An experimental study

Lee,G. ; Wen,C.

Pub. info.:	Display technologies III : 26-27 July 2000, Taipei, Taiwan. pp.271-278, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4079

Conference Proceedings

6. "Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process"

Koh,C.-W. ; Jung,J.-C. ; Kim,M.-S. ; Kong,K.-K. ; Lee,G. ; Jung,M.-H. ; Kim,J.-S. ; Shin,K.-S.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.798-803, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

7. Novel routes toward sub-70-nm contact windows by using new KrF photoresist

Kim,J.-S. ; Koh,C.-W. ; Lee,G. ; Jung,J.-C. ; Shin,K.-S.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.232-240, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

8. Novel high-performance ArF resist for sub-100-nm lithography

Lee,G. ; Koh,C.-W. ; Jung,J.-C. ; Jung,M.-H. ; Kong,K.-K. ; Kim,J.-S. ; Shin,K.-S. ; Choi,S.-J. ; Kim,Y.-S. ; Choi,Y.-J. ; Kim,D.-B.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.150-158, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

9. Band-limited interpolation for maximum-intensity projection images

Kim,S. ; Song,S.M.-H. ; Kim,N.-H. ; Lee,G. ; Kreang-arekul,S. ; Iwase,A. ; Taylor,R.

Pub. info.:	High-Speed Imaging and Sequence Analysis III. pp.78-85, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4308

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Conference Proceedings

10. Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs

Choi,S.-J. ; Choi,Y.-J. ; Kim,Y.-S. ; Kim,S.-D. ; Kim,D.-B. ; Kim,J.-H. ; Koh,C.-W. ; Lee,G. ; Jung,J.-C. ; Baik,K.-H.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.94-105, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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Author: Lee,G.