1.

Conference Proceedings
Conference Proceedings
1. The evaluation of aberration effects according to pattern shape and duly ratio
Lee, J.-E. ; Park, S.-W. ; Lee, C.-H. ; Oh, H.-W. ; Bae, S.-Y. ; Oh, H.-K.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1738-1749,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Simulation benchmarking for the whole resist process
Kim, S.-K. ; Lee, J.-E. ; Park, S.-W. ; Yoo, J.-Y. ; Oh, H.-
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.58-64,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
3.

Conference Proceedings
Conference Proceedings
3. Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]
Kwak, E. A. ; Jung, M. R. ; Kim, D.-G. ; Lee, J.-E. ; Oh, H.-K. ; Lee, S.
Pub. info.: Optical Microlithography XIX.  pp.61542T-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154