1.

Conference Proceedings
Conference Proceedings
1. Using X-ray microprobes for environmental research
Kemner, K.M. ; Yun, W. ; Cai, Z. ; Lai, B. ; Lee, H.-R. ; Legnini, D.G. ; Rodrigues, W. ; Jastrow, J. ; Miller, R.M. ; Pratt, S.T. ; Schneegurt, M.A. ; Kulpa, C.F., Jr. ; Smucker, A.J.M.
Pub. info.: X-ray microfocusing : applications and techniques : 22-23 July 1998, San Diego, California.  pp.45-54,  1998.  Bellingham, Wash., USA.  SPIE
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3449
2.

Conference Proceedings
Conference Proceedings
2. Water distribution within immersed polymer films
Kang, Y. ; Hong, J. ; Lee, S.-Y. ; Lee, H.-R. ; Ryoo, M.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.31-39,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
3.

Conference Proceedings
Conference Proceedings
3. X-Ray Microbeam Techniques and Applications
Isaacs, E.D. ; Evans-Lutterodt, K. ; Marcus, M.A. ; Macdowell, A.A. ; Lehnert, W. ; Vandenberg, J.M. ; Sputz, S. ; Johnson, J.E. ; Grenko, J. ; Ketelsen, L.J.P. ; Pinzone, C. ; Glew, R. ; Yun, W. ; Cai, Z. ; Rodrigues, W. ; Lee, H.-R. ; Lai, B.
Pub. info.: Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.49-59,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-12
4.

Technical Paper
Technical Paper
4. Development of metrological nde methods for microturbine ceramic components
Lee, H.-R. ; Ellingson, W. A.
Pub. info.: A.S.M.E. paper.  2000.  New York.  American Society of Mechanical Engineers
Title of ser.: ASME Technical Paper : GT
Ser. no.: 2000
5.

Conference Proceedings
Conference Proceedings
5. Evaluation of puddle time effect and optimization of development process in 193-nm lithography
Lee, H.-R. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1115-1122,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. Comprehensive analysis of sources of total CD variation in ArF resist perspective
Kim, H.-W. ; Lee, H.-R. ; Kim, K.-M. ; Lee, S.Y. ; Kim, B.-C. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.254-265,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376