1.

Conference Proceedings
Conference Proceedings
1. Implications of immersion lithography on 193-nm photoresists
Taylor, J.C. ; Chambers, C.R. ; Deschner, R. ; LeSuer, R.J. ; Conley, W.E. ; Burns, S.D. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.34-43,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. Using scanning electrochemical microscopy to probe chemistry at the solid-liquid interface in chemically amplified immersion lithography
LeSuer, R.J. ; Fan, F.-R.F. ; Bard, A.J. ; Taylor, J.C. ; Tsiartas, P. ; Willson, G. ; Conley, W.E. ; Feit, G. ; Kunz, R.R.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.115-125,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376