1.

Conference Proceedings
Conference Proceedings
1. Simulation analysis of defect repair methods for EUVL Mo/Si multilayer mask blanks
Latypov, A. ; Albright, R. ; BabaAli, N. ; Cebuhar, W. A. ; Hintersteiner, J. D. ; Stone, E.
Pub. info.: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.466-476,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5751
2.

Conference Proceedings
Conference Proceedings
2. Achieving mask-based imaging with optical maskless lithography [6151-87]
Stone, E. M. ; Hintersteiner, J. D. ; Cebuhar, W. A. ; Albright, R. ; Eib, N. K. ; Latypov, A. ; Baba-Ali, N. ; Poultney, S. K. ; Croffie, E. H.
Pub. info.: Emerging Lithographic Technologies X.  pp.61512E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
3.

Conference Proceedings
Conference Proceedings
3. Analysis of optical lithography capabilities of pixelized photomasks and spatial light modulators [6349-27]
Latypov, A.
Pub. info.: Photomask Technology 2006.  pp.63490R-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
4.

Conference Proceedings
Conference Proceedings
4. Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node
Croffie, E.H. ; Eib, N. ; Callan, N.P. ; Baba-Ali, N. ; Latypov, A. ; Hintersteiner, J. ; Sandstrom, T. ; Bleeker, A. ; Cummings, K.D.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.842-850,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256