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Conference Proceedings

1. CHEMICAL VAPOR DEPOSITION OF GOLD

Larson, C.E. ; Baum, T.H. ; Jackson, R.L.

Pub. info.:	Photon, beam, and plasma stimulated chemical processes at surfaces : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.. pp.721-724, 1987. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	75

Conference Proceedings

2. CHEHIAL VAPOR DEPOSITION OF CHROMIUM CARBIDE FROM ORGANOMETALLIC PRECURSORS

Rutherfold,N.M. ; Larson, C.E. ; Jackson, R.L.

Pub. info.:	Chemical perspectives of microelectronic materials : symposium held November 30-December 2, 1988, Boston, Massachusetts, U.S.A.. pp.439-446, 1989. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	131

Conference Proceedings

3. LASER-INDUCED CHEMICAL VAPOR DEPOSITION OF HIGH PURITY ALUMINUM

Baum, T.H. ; Larson, C.E. ; Jackson, R.L.

Pub. info.:	Laser and particle-beam chemical processes on surfaces : symposium held November 29-December 2, 1988, Boston, Massachusetts, U.S.A.. pp.119-124, 1989. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	129

Conference Proceedings

4. 193-nm negative resist based on acid-catalyzed elimination of polar molecules

Sooriyakumaran, R. ; Davis, B.W. ; Larson, C.E. ; Brock, P.J. ; DiPietro, R.A. ; Wallow, T.I. ; Connor, E.F. ; Sundberg, L.K. ; Breyta, G. ; Allen, R.D. ; Patel, K.S. ; Varanasi, P.R.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.71-78, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

5. Liquid immersion lithography: evaluation of resist issues

Hinsberg, W. ; Wallraff, G.M. ; Larson, C.E. ; Davis, B.W. ; Deline, V. ; Raoux, S. ; Miller, D. ; Houle, F.A. ; Hoffnagle, J. ; Sanchez, M.I. ; Rettner, C. ; Sundberg, L.K. ; Medeiros, D.R. ; Dammel, R.R. ; Conley, W.E.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.21-33, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

6. Aliphatic platforms for the design of 157-nm chemically amplified resists

Ito, H. ; Truong, H.D. ; Okazaki, M. ; Miller, D.C. ; Fender, N. ; Breyta, G. ; Brock, P.J. ; Wallraff, G.M. ; Larson, C.E. ; Allen, R.D.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.18-28, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

7. Carbon nanotube scanning probe for surface profiling of DUV and 193-nm photoresist pattern

Nguyen, C.V. ; Stevens, R.M.D. ; Barber, J. ; Han, J. ; Meyyappan, M. ; Sanchez, M.I. ; Larson, C.E. ; Hinsberg, W.D.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part One pp.58-62, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

Conference Proceedings

8. Characterization and acid diffusion measurements of new strong acid photoacid generators

Wallraff, G.M. ; Larson, C.E. ; Fender, N. ; Davis, B. ; Medeiros, D.R. ; Meute, J. ; Lamanna, W.M. ; Parent, M.J. ; Robeledo, T. ; Young, G.L.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.160-168, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

9. Combinitorial resist processing studies

Larson, C.E. ; Wallraff, G.M.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1165-1173, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

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Conference Proceedings

10. Optimized acid release underlayers for 157-nm lithography

Larson, C.E. ; Wallraff, G.M. ; Johnson, L. ; Brock, P.J. ; Sundberg, L.K.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1174-1180, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

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Author: Larson, C.E.