1.

Conference Proceedings
Conference Proceedings
1. Definition of new quality criteria and assessment means for masks at 150-nm design rules and beyond
Baracchi,E. ; Bruck,H.-J. ; Engel,T. ; Eran,Y. ; Lalanne,F.P. ; Maurin,O. ; Ordynskyy,V. ; Schatz,T. ; Sommer,K.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.178-188,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Application of a new approach to optical proximity correction
Rosenbusch,A. ; Hourd,A.C. ; Juffermans,C.A. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Vermeuien,T. ; Watson,J.C. ; Ziegler,W.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.639-647,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Clear-field alternating PSM for 193-nm lithography
Schiavone,P. ; Lalanne,F.P. ; Prola,A.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.582-589,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Cluster tool solution for fabrication and qualification of advanced photomasks
Schatz,T. ; Hartmann,H. ; Peter,K. ; Lalanne,F.P. ; Maurin,O. ; Baracchi,E. ; Miramond,C. ; Bruck,H.-J. ; Scheuring,G. ; Engel,T. ; Eran,Y. ; Sommer,K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.84-92,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
5.

Conference Proceedings
Conference Proceedings
5. New approach to optical proximity correction
Rosenbusch,A. ; Juffermans,A.H. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Watson,J.C. ; Ziegler,W. ; Zimmermann,R.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.585-593,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
6.

Conference Proceedings
Conference Proceedings
6. 0.2-ｦﾌm lithography using i-line and alternating phase-shift mask
Schiavone,P. ; Lalanne,F.P.
Pub. info.: Optical Microlithography IX.  Part2  pp.453-460,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
7.

Conference Proceedings
Conference Proceedings
7. Alternating phase-shift generation for complex circuit designs
Galan,G. ; Lalanne,F.P. ; Tissier,M. ; Belleville,M.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.508-519,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884