1.

Conference Proceedings
Conference Proceedings
1. Cleaning techniques for low-k dielectric materials for advanced interconnects
Louis,D. ; Lajoinie,E. ; Holmes,D. ; Lee,S. ; Peyne,C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.1420-1425,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. 193-nm scanner characterization by SEM and electrical CD measurements
Pain,L. ; Trouiller,Y. ; Barberet,A. ; Guirimand,O. ; Fanget,G.L. ; Martin,N. ; Quere,Y. ; Nier,M.E. ; Lajoinie,E. ; Louis,D. ; Heitzmann,M. ; Scheiblin,P. ; Toffoli,A.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.96-107,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
3.

Conference Proceedings
Conference Proceedings
3. Improved post-etch cleaning of dual-damascene system for 0.18-ｦﾌm technology
Louis,D. ; Peyne,C. ; Lajoinie,E. ; Vallesi,B. ; Maloney,D.J. ; Lee,S.
Pub. info.: Multilevel Interconnect Technology II.  pp.162-169,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3508