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Conference Proceedings

1. In-line lithography cluster monitoring and control using integrated scatterometry

Pollentier, I. ; Cheng, S.Y. ; Baudemprez, B. ; Laidler, D. ; van Dommelen, Y. ; Carpaij, R. ; Yu, J. ; Uchida, J. ; Viswanathan, A. ; Chin, D. ; Barry, K. ; Jakatdar, N.

Pub. info.:	Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA. pp.105-115, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5378

Conference Proceedings

2. Immersion effects on lithography system performance [6154-30]

Nagahara, S. ; Pollentier, I. ; Machida, T. ; O’Brien, S. ; Jacobs, E. ; Schaap, C. ; Leroy, P. ; Storms, G. ; Nafus, K. ; Laidler, D. ; Cheng, S.

Pub. info.:	Optical Microlithography XIX. pp.61540U-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

3. Advances in process overlay: ATHENA alignment system performance on critical process layers

Laidler, D. ; Megens, H.J. ; Lalbahadoersing, S. ; van Haren, R.J. ; Bornebroek, F.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part One pp.397-408, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

Conference Proceedings

4. Comparison of ATHENA and TTL alignment capability in product wafers

Opitz, J. ; Laidler, D.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part Two pp.852-862, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

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