1.

Conference Proceedings
Conference Proceedings
1. Understanding systematic and random CD variations using predictive modeling techniques
Flagello,D.G. ; Laan,H.van der ; Schoot,J.van ; Bouchoms,I. ; Geh,B.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.162-175,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Focus and exposure dose determination using stepper alignment
Dirksen,P. ; Pellens,R. ; Juffermans,C.A. ; Reuhman-Huisken,M.E. ; Laan,H.van der
Pub. info.: Optical Microlithography IX.  Part2  pp.799-808,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
3.

Conference Proceedings
Conference Proceedings
3. Application of the aberration ring test (ARTEMIS) to determine lens quality and predict its lithographic performance
Moers,M.H. ; Laan,H.van der ; Zellenrath,M. ; Boeij,W.de ; Beaudry,N.A. ; Cummings,K.D. ; Zwol,A.van ; Becht,A. ; Willekers,R.
Pub. info.: Optical Microlithography XIV.  4346  pp.1379-1387,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. Aerial image measurement methods for fast aberration set-up and illumination pupil verification
Laan,H.van der ; Dierichs,M. ; Greevenbroek,H.van ; McCoo,E. ; Stoffels,F. ; Pongers,R. ; Willekers,R.
Pub. info.: Optical Microlithography XIV.  4346  pp.394-407,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346