1.

Conference Proceedings
Conference Proceedings
1. The transfer of photoresist LER through etch [6153-45]
Pawloski, A. R. ; Acheta, A. ; Bell, S. ; La Fontaine, B. ; Wallow, T. ; Levinson, H. J.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615318-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
2.

Conference Proceedings
Conference Proceedings
2. Demonstration of phase-shift masks for extreme-ultraviolet lithography [6151-10]
La Fontaine, B. ; Pawloski, A. R. ; Wood, O. ; Deng, Y. ; Levinson, H. J. ; Naulleau, P. ; Denham, P. E. ; Gullikson, E. ; Hoef, B. ; Holfeld, C. ; Chovino, C. ; Letzkus, F.
Pub. info.: Emerging Lithographic Technologies X.  pp.61510A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
3.

Conference Proceedings
Conference Proceedings
3. Defect printability study using EUV lithography [6151-30]
Holfeld, C. ; Bubke, K ; Lehmann, F. ; La Fontaine, B. ; Pawloski, A.. R. ; Schwarzl, S. ; Kamm, F M ; Graf T ; Erdmann, A
Pub. info.: Emerging Lithographic Technologies X.  pp.61510U-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
4.

Conference Proceedings
Conference Proceedings
4. Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists [6151-34]
Naulleau, P. P. ; Rammeloo, C. ; Cain, J. P. ; Dean, K. ; Denham, P. ; Goldberg, K. A. ; Hoef, B. ; La Fontaine, B. ; Pawloski, A. R. ; Larson, C. ; Wallraff, G
Pub. info.: Emerging Lithographic Technologies X.  pp.61510Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
5.

Conference Proceedings
Conference Proceedings
5. Flare and its impact on low-k1 KrF and ArF lithography
La Fontaine, B. ; Dusa, M.V. ; Acheta, A. ; Chen, C. ; Bourov, A. ; Levinson, H.J. ; Litt, L.C. ; Mulder, M. ; Seltman, R. ; van Praagh, J.
Pub. info.: Optical Microlithography XV.  Part One  pp.44-56,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Comparative study of mask architectures for EUV lithography
Pawloski, A. R. ; La Fontaine, B. ; Levinson, H. J. ; Hirscher, S. ; Schwarzl, S. ; Lowack, K. ; Kamm, F. -M. ; Bender, M. ; Domke, W. -D. ; Holfeld, C. ; Dersch, U. ; Naulleau, P. ; Letzkus, F. ; Butschke, J.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.762-773,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
7.

Conference Proceedings
Conference Proceedings
7. Performance of repaired defects and attPSM in EUV multilayer masks
Deng, Y. ; La Fontaine, B. ; Neureuther, A.R.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.418-425,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
8.

Conference Proceedings
Conference Proceedings
8. Evaluation and characterization of flare in ArF lithography
Litt, L.C. ; Bourov, A. ; La Fontaine, B. ; Apelgren, E.M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1442-1452,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
9.

Conference Proceedings
Conference Proceedings
9. Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors
La Fontaine, B. ; Pawloski, A.R. ; Deng, Y. ; Chovino, C. ; Dieu, L. ; Wood, O.R., II ; Levinson, H.J.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.300-310,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
10.

Conference Proceedings
Conference Proceedings
10. Simulation of fine structures and defects in EUV etched multilayer masks
Deng, Y. ; La Fontaine, B. ; Pawloski, A.R. ; Neureuther, A.R.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.760-769,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374