1.

Conference Proceedings
Conference Proceedings
1. Optimization of CD control in DUV positive resists: influence of photoresist viscoelastic properties on PEB conditions
F. Vinet ; N. Buffet ; P. Fanton ; L. Pain ; P.J. Paniez
Pub. info.: Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California.  pp.202-210,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2438
2.

Conference Proceedings
Conference Proceedings
2. Electron beam lithography simulation based on a single convolution approach: application for sub-45nm nodes
J. C. L. denmat ; S. Manakli ; B. Icard ; C. Soonekindt ; B. Minghetti ; O. L. borgne ; L. Pain
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533
3.

Conference Proceedings
Conference Proceedings
3. Electron beam direct write: shaped beam overcomes resolution concerns
I. Stolberg ; L. Pain ; J. Kretz ; M. Boettcher ; H. Doering ; J. Gramss ; P. Hahmann
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533
4.

Conference Proceedings
Conference Proceedings
4. Magic: a European program to push the insertion of maskless lithography
L. Pain ; B. Icard ; S. Tedesco ; B. Kampherbeek ; G. Gross
Pub. info.: Emerging lithographic technologies XII.  1  pp.69211S-1-69211S-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921
5.

Conference Proceedings
Conference Proceedings
5. New alignment marks for improved measurement maturity
U. Weidenmueller ; H. Alves ; B. Schnabel ; B. Icard ; L. Pain
Pub. info.: EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany.  pp.679211-1-679211-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6792