1.

Conference Proceedings
Conference Proceedings
1. Defects, overlay, and focus performance improvements with five generations of immersion exposure systems
J. Mulkens ; B. Streefkerk ; H. Jasper ; J. de Klerk ; F. de Jong ; L. Levasier ; M. Leenders
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Performance of a 1.35NA ArF immersion lithography system for 40-nm applications
J. de Klerk ; C. Wagner ; R. Droste ; L. Levasier ; L. Jorritsma ; E. van Setten ; H. Kattouw ; J. Jacobs ; T. Heil
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520