1.

Conference Proceedings
Conference Proceedings
1. New pattern generation system based on i-line stepper:photomask repeater
Kyoh,S. ; lnoue,S. ; Higashikawa,I. ; Mori,I. ; Okumura,K. ; Irie,N. ; Muramatsu,K. ; Magome,N.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.647-657,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask
Kyoh,S. ; Sakurai,H. ; Iwamatsu,T. ; Yamada,A. ; Higashikawa,I.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.127-133,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
3.

Conference Proceedings
Conference Proceedings
3. New concept photomask repeater with stitching exposure technique
Irie,N. ; Muramatsu,K. ; Ishii,Y. ; Magome,N. ; Umatate,T. ; Kyoh,S. ; Tanaka,S. ; Inoue,S. ; Higashikawa,I. ; Mori,I. ; Okumura,K.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.34-45,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
4.

Conference Proceedings
Conference Proceedings
4. New-concept i-line stepper for mask fabrication
Irie,N. ; Muramatsu,K. ; Ishii,Y. ; Magome,N. ; Umatate,T. ; Kyoh,S. ; Tanaka,S. ; Inoue,S. ; Higashikawa,I. ; Mori,I. ; Okumura,K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.641-648,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
5.

Conference Proceedings
Conference Proceedings
5. New photomask Pattern generation method based on i-line stepper
Kyoh,S. ; Tanaka,S. ; Inoue,S. ; Higashikawa,I. ; Mori,I. ; Okumura,K. ; Irie,N. ; Muramatsu,K. ; Ishii,Y. ; Magome,N. ; Umatate,T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.631-640,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
6.

Conference Proceedings
Conference Proceedings
6. Management of pattern generation system based on I-line stepper
Kyoh,S. ; Tanaka,S. ; Inoue,S. ; Higashikawa,I. ; Mori,I. ; Okumura,K. ; Irie,N. ; Muramatsu,K. ; Ishii,Y. ; Magome,N. ; Umatate,T.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.494-502,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
7.

Conference Proceedings
Conference Proceedings
7. Improvement of photomask repeater for 130-nm lithography
Kyoh,S. ; Inoue,S. ; Mori,I. ; Irie,N. ; Ishii,Y. ; Umatate,T. ; Kokubo,H. ; Hayashi,N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.277-286,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
8.

Conference Proceedings
Conference Proceedings
8. Deep-UV attenuated phase-shift mask for quarter-micrometer photolithography
Kyoh,S. ; Sakurai,H. ; Iwamatsu,T. ; Higashikawa,I. ; Taniguchi,R. ; Watanabe,H. ; Tuchiya,T.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.300-309,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621