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13 results

Conference Proceedings

1. High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making

Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Lang,R. ; Robinson,C.F. ; Medeiros,D.R. ; Petrillo,K.E. ; Aviram,A. ; Mahorowala,A.P. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M. ; Faure,T.B.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.268-277, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers

Huang,W.-S. ; Sooriyakumaran,R. ; Kwong,R.W. ; Katnani,A.D.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.776-785, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Structure and property relationships of fractionated novolac resins

Chen,K.-J.R. ; Kwong,R.W. ; Jordhamo,G. ; Allen,R.D. ; Gallagher-Wetmore,P.M.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.596-607, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

4. CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making

Kwong,R.W. ; Huang,W.-S. ; Hartley,J.G. ; Moreau,W.M. ; Robinson,C. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.352-360, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

5. Acid amplifiers:proton transfer or direct acid formation

Huang,W. ; Kwong,R.W. ; Moreau,W.M.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.591-597, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

6. Acid diffusion in a chemically amplified negative i-line photoresist

Connolly,J. ; Chen,K.R. ; Kwong,R.W. ; Lawson,M. ; Linehan,L.L. ; Moreau,W.M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.1124-1131, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

7. Method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist:KRS

Petrillo,K. ; Brancaccio,J. ; Huang,W.-S. ; Kwong,R.W. ; Katnani,A.D.

Pub. info.:	Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California. pp.319-328, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3048

Conference Proceedings

8. CA resist with high sensitivity and sub-100-nm resolution for advanced mask making

Huang,W.-S. ; Kwong,R.W. ; Hartley,J.G. ; Moreau,W.M. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.150-159, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

9. Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication

Magg,C. ; Lercel,M.J. ; Lawliss,M. ; Kwong,R.W. ; Huang,W.-S. ; Angelopoulos,M.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.707-716, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

10.

Conference Proceedings

10. Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making

Medeiros,D.R. ; Petrillo,K.E. ; Bucchignano,J. ; Angelopoulos,M. ; Huang,W.-S. ; Li,W. ; Moreau,W.M. ; Lang,R. ; Kwong,R.W. ; Magg,C. ; Ashe,B.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.552-560, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

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