1.

Conference Proceedings
Conference Proceedings
1. Applicaton of blends and side chain Si-O copolymers as high-etch resistant sub-100-nm E-beam resists
Huang, W.-S. ; Kwong, R.W. ; Moreau, W.M. ; Lang, R. ; Medeiros, D.R. ; Petrillo, K.E. ; Mahorowala, A.P. ; Angelopoulos, M. ; Lin, Q. ; Dai, J. ; Ober, C.K.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.432-441,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Evolution of a 193-nm bilayer resist for manufacturing
Kwong, R.W. ; Khojasteh, M. ; Lawson, P. ; Hughes, T. ; Varanasi, P.R. ; Brunsvold, B. ; Allen, R.D. ; Brock, P.J. ; Sooriyakumaran, R. ; Truong, H.D. ; Mahorowala, A.P. ; Medeiros, D.R.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.403-409,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. BEOL lithography for early development at the 65-nm node
DellaGuardia, R. ; Kwong, R.W. ; Li, W. ; Lawson, P. ; Burkhardt, M. ; Grauer, I.C. ; Wu, Q. ; Angyal, M. ; Hichri, H. ; Melville, I. ; Kumar, K. ; Lin, Y. ; Holmes, S.J. ; Varanasi, R. ; Spooner, T. ; McHerron, D.
Pub. info.: Optical Microlithography XVII.  pp.980-987,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
4.

Conference Proceedings
Conference Proceedings
4. Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
Pfeiffer, D. ; Mahorowala, A.P. ; Babich, K. ; Medeiros, D.R. ; Petrillo, K.E. ; Angelopoulos, M. ; Huang, W.-S. ; Halle, S. ; Brodsky, C. ; Allen, S.D. ; Holmes, S.J. ; Kwong, R.W. ; Lang, R. ; Brock, P.J.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.136-143,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
5.

Conference Proceedings
Conference Proceedings
5. Rational design in cyclic olefin resists for sub-100-nm lithography
Li, W. ; Varanasi, P.R. ; Lawson, M.C. ; Kwong, R.W. ; Chen, K.-J. ; Ito, H. ; Truong, H.D. ; Allen, R.D. ; Yamamoto, M. ; Kobayashi, E. ; Slezak, M.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.61-69,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
6.

Conference Proceedings
Conference Proceedings
6. High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities
Khojasteh, M. ; Chen, K.R. ; Kwong, R.W. ; Lawson, M.C. ; Varanasi, P.R. ; Patel, K.S. ; Kobayashi, E.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.187-194,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
7.

Conference Proceedings
Conference Proceedings
7. Impact of thin resist processes on post-etch LER
Mahorowala, A.P. ; Goldfarb, D.L. ; Temple, K. ; Petrillo, K.E. ; Pfeiffer, D. ; Babich, K. ; Angelopoulos, M. ; Gallatin, G.M. ; Rasgon, S. ; Sawin, H.H. ; Allen, S.D. ; Lang, R.N. ; Lawson, M.C. ; Kwong, R.W. ; Chen, K.-J. ; Li, W. ; Varanasi, P.R. ; Sanchez, M.I. ; Ito, H. ; Wallraff, G.M. ; Allen, R.D.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.213-224,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039