1.

Conference Proceedings
Conference Proceedings
1. Time Dependence of Electrical Resistance and ESR Defects in Surface Conductive Layer On Diamond Films
Gi, R.S. ; Show, Y. ; Akiba, Y. ; Kurosu, T. ; Izumi, T. ; Iida, M.
Pub. info.: Proceedings of the Fifth International Symposium on Diamond Materials.  pp.674-681,  1997.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-32
2.

Conference Proceedings
Conference Proceedings
2. SELECTIVE DEPOSITION OF DIAMOND FILM ON MIRROR POLISHED Si-WAFER
Iida, M. ; Akiba, Y. ; Kurosu, T. ; Hirose, Y. ; Matsumae, Y.
Pub. info.: Proceedings of the Third International Symposium on Diamond Materials.  pp.829-838,  1993.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-17
3.

Conference Proceedings
Conference Proceedings
3. Correlation Between Defects and Electrical Conduction in Surface Conductive Layer of CVD Diamond Films
Show, Y. ; Matsuoka, F. ; Ri, S. ; Akiba, Y. ; Kurosu, T. ; Iida, M. ; Izumi, T.
Pub. info.: Defects in electronic materials II : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A..  pp.681-,  1997.  Pittsburgh, Penn.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 442
4.

Conference Proceedings
Conference Proceedings
4. Advanced image placement performance for the current EPL masks [6151-53]
Eguchi, H. ; Sugimura, H. ; Koike, K. ; Sakaue, H. ; Arimoto, H. ; Ogawa, K. ; Susa, T. ; Kunitani, S. ; Kurosu, T. ; Yoshii, T. ; Itoh, K.
Pub. info.: Emerging Lithographic Technologies X.  pp.61511G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
5.

Conference Proceedings
Conference Proceedings
5. Low-stress stencil masks using SOI substrates for EPL and LEEPL
Eguchi, H. ; Kurosu, T. ; Yoshii, T. ; Sugimura, H. ; Itoh, K. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.879-887,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
6.

Conference Proceedings
Conference Proceedings
6. Low-stress stencil masks using a doping method
Eguchi, H. ; Kurosu, T. ; Yoshii, T. ; Sugimura, H. ; Itoh, K. ; Tamura, A.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.871-879,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
7.

Conference Proceedings
Conference Proceedings
7. Image placement of large window-size membrane for EPL and LEEPL mask [5853-80]
Eguchi, H. ; Sumida, T. ; Susa, T. ; Negishi, Y. ; Kurosu, T. ; Yoshii, T. ; Yamazaki, T. ; Yotsui, K. ; Sugimura, H. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.910-920,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
8.

Conference Proceedings
Conference Proceedings
8. Global image placement of LEEPL mask
Eguchi, H. ; Susa, T. ; Sumida, T. ; Kurosu, T. ; Yoshii, T. ; Yotsui, K. ; Sugimura, H. ; Itoh, K. ; Tamura, A.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.935-942,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567