1.

Conference Proceedings
Conference Proceedings
1. Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography
Kurose, E. ; Watanabe, K. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.603-614,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography
Watanabe, K. ; Kurose, E. ; Suganaga, T. ; Itani, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.736-744,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. 157-nm lithography for 65-nm node SRAM-gate
Suganaga, T. ; Irie, S. ; Miyoshi, S. ; Kim, J.-H. ; Watanabe, K. ; Kurose, E. ; Furukawa, T. ; Hagiwara, T. ; Ishimaru, T. ; Itani, T.
Pub. info.: Optical Microlithography XVI.  Part One  pp.261-269,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node
Suganaga, T. ; Lee, J.-W. ; Kurose, E. ; Ishimaru, T. ; Furukawa, T. ; Itani, T. ; Fujii, K. ; Cashmore, J.S. ; Gower, M.
Pub. info.: Optical Microlithography XVII.  pp.104-115,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens
Watanabe, K. ; Kurose, E. ; Suganaga, T. ; Itani, T.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1378-1385,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040