1.

Conference Proceedings
Conference Proceedings
1. Plasma Etching Mechanism of Metel Oxides Derived from RIE of Ta2O5 and TiO2
Kuo, Y.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.536-544,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
2.

Conference Proceedings
Conference Proceedings
2. Thin Film Transistors in ULSI -Status and Future*
Kuo, Y.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.322-329,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
3.

Conference Proceedings
Conference Proceedings
3. Influence of the 5 A TaNx Interface Layer on Doped Metal Oxide High-k Dielectric Characterization
Kuo, Y. ; Lu, J.
Pub. info.: Dielectrics in emerging technologies : proceedings of the international symposium.  pp.374-380,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-1
4.

Conference Proceedings
Conference Proceedings
4. Amorphous Silicon Thin Film Transistor Fabricated with a New Copper Dry Etching Method
Lee, S. ; Kuo, Y. ; Donnely, J.P. ; Tewg, J.-Y. ; Lee, H.
Pub. info.: Thin Film Transistor Technologies V : proceedings of the International Symposium.  pp.34-39,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-31
5.

Conference Proceedings
Conference Proceedings
5. High Temperature Reactive Ion Etching of Indium Tin Oxide: The Non-Additive Feed Gas Effect
Kuo, Y.
Pub. info.: Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes.  pp.71-78,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-30
6.

Conference Proceedings
Conference Proceedings
6. High Rate, Lateral Growth of Polysilicon Film on Low Temperature Glass Using Pulsed Rapid Thermal Annealing Method
Kuo, Y.
Pub. info.: Proceedings of the Third Symposium on Thin Film Transistor Technologies.  pp.30-35,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-23
7.

Conference Proceedings
Conference Proceedings
7. Reactive Ion Etching of Indium Tin Oxide - HBr Chemistry
Kuo, Y.
Pub. info.: Proceedings of the twelfth International Symposium on Plasma Processing.  pp.197-202,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-4
8.

Conference Proceedings
Conference Proceedings
8. Process Study of a New Copper Dry Etching Method - The HCI Chemistry
Lee, S. ; Kuo, Y.
Pub. info.: Plasma processing XIII : proceedings of the international symposium.  pp.361-367,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-6
9.

Conference Proceedings
Conference Proceedings
9. Plasma Enhanced Chemical Vapor Deposition of SiNk for Thin Film Transistors
Kuo, Y.
Pub. info.: Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition.  pp.350-356,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-2
10.

Conference Proceedings
Conference Proceedings
10. Hydrogenation of Amorphous Silicon Thin Film Transistors
Kuo, Y.
Pub. info.: Proceedings of the fourth Symposium on Thin Film Transistor Technologies.  pp.191-197,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-22