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16 results

Conference Proceedings

1. Damage testing of pellicles for 193-nm lithography

Liberman,V. ; Kunz,R.R. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Grenville,A. ; Bates,A.K. ; Van,Peski,C.K.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.480-495, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

2. Chemical concentrator for rapid vapor detection

Ceis,M.W. ; Kunz,R.R.

Pub. info.:	Detection and remediation technologies for mines and minelike targets IV : 5-9 April, 1999, Orlando, Florida. Part1 pp.421-432, 1999. Bellingham, Washington. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3710

Conference Proceedings

3. Experimentation and modeling of organic photocontamination on lithographic optics

Kunz,R.R. ; Liberman,V. ; Downs,D.K.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.474-487, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

4. Line-edge roughness in sub-0.18-ｦﾌm resist patterns

Palmateer,S.C. ; Cann,S.G. ; Curtin,J.E. ; Doran,S.P. ; Eriksen,L.M. ; Forte,A.R. ; Kunz,R.R. ; Lyszczarz,T.M. ; Stern,M.B. ; Nelson,C.M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.634-642, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

5. Prospects for using existing resists for evaluating 157-nm imaging systems

Fedynyshyn,T.H. ; Kunz,R.R. ; Doran,S.P. ; Goodman,R.B. ; Lind,M.L. ; Curtin,J.E.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.335-346, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

6. New materials for 157-nm photoresists characterization and properties

Crawford,M.K. ; Feiring,A.E. ; Feldman,J. ; French,R.H. ; Periyasamy,M.P. ; III,F.L.Schadt ; Smalley,R.J. ; Zurnsteg,F.C. ; Kunz,R.R. ; Rao,V. ; Liao,L. ; Holl,S.M.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.357-364, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

7. Bilayer resist approach for 193-nm lithography

Schaedeli,U.P. ; Tinguely,E. ; Blakeney,A.J. ; Falcigno,P.A. ; Kunz,R.R.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.344-354, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

8. Protecting groups for 193-nm photoresists

Allen,R.D. ; Sooriyakumaran,R. ; Opitz,J. ; Wallraff,G.M. ; DiPietro,R.A. ; Breyta,G. ; Hofer,D.C. ; Kunz,R.R. ; Jayaraman,S. ; Shick,R. ; Goodall,B. ; Okoroanyanwu,U. ; Wilson,C.G.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.334-343, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

9. Limits to etch resistance for 193-nm single-layer resists

Kunz,R.R. ; Palmateer,S.C. ; Forte,A.R. ; Allen,R.D. ; Wallraff,G.M. ; DiPietro,R.A. ; Hofer,D.C.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.365-376, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

10.

Conference Proceedings

10. Performance of a phase-shift focus monitor reticle designed for 193-nm use

Kunz,R.R. ; Chan,M.Y. ; Doran,S.P.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.108-115, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

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