1.

Conference Proceedings
Conference Proceedings
1. RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography
Hsu,S. ; Shi,X. ; Hsu,M. ; Corcoran,N.P. ; Chen,J.F. ; Desai,S. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Chen,A. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.172-185,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
2.

Conference Proceedings
Conference Proceedings
2. Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor
Hsu,S. ; Shi,X. ; Socha,R.J. ; Chen,J.F. ; Yee,J.C. ; Anath,M. ; Desai,S. ; Imamura,P.H. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Hsu,S. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.783-796,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344