1.

Conference Proceedings
Conference Proceedings
1. Investigating positive DUV resist profile on TiN
He,Q. ; Krisa,W.L. ; Lee,W.W. ; Hsu,W.-Y. ; Yang,H.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.988-996,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
2.

Conference Proceedings
Conference Proceedings
2. Application of deep-UV resist for 0.25-ｦﾌm metal and poly processing
Krisa,W.L. ; Progler,C.J. ; Brennan,K. ; Schell,J.C.
Pub. info.: Optical Microlithography IX.  Part1  pp.125-134,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
3.

Conference Proceedings
Conference Proceedings
3. 0.25-ｦﾌm multilevel interconnect with DUV processing
Krisa,W.L. ; Shaw,S.Y. ; Brennan,K. ; Dixit,G.A. ; Jain,M.K.
Pub. info.: Optical Microlithography X.  pp.352-361,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051