1.

Conference Proceedings
Conference Proceedings
1. ACLV control in x-ray lithography
Krasnoperova,A.A. ; Rippstein,R.P. ; Puisto,D.M. ; Rocque,J.M.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.165-178,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
2.

Conference Proceedings
Conference Proceedings
2. X ray fills the gap
Wasik,C. ; Murphy,G.P. ; Chen,A.C. ; Krasnoperova,A.A. ; Flamholz,A.L. ; DeMay,D.D. ; Leavey,J.A. ; Loh,S. ; Chaloux,S. ; Thomas,A.C. ; Lee,S. ; Giewont,K.J. ; Agnello,P.D.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.150-156,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
3.

Conference Proceedings
Conference Proceedings
3. Imaging capabilities of proximity x-ray lithography at 70-nm ground rules
Krasnoperova,A.A. ; Rippstein,R.P. ; Flamholz,A.L. ; Kratschmer,E. ; Wind,S. ; Brooks,C.J. ; Lercel,M.J.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.24-39,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of the Defense Advanced Lithography Program(DALP)x-ray lithography aligner
Chen,A.C. ; Flamholz,A.L. ; Krasnoperova,A.A. ; Rippstein,R.P. ; Vampatella,B.R. ; Gomba,G.A. ; Fair,R.H. ; Chu,W. ; Dimilia,V. ; Silverman,J.P. ; Amodeo,R.J. ; Heald,D.A. ; Kochersperger,P.C. ; Stahlhammer,C.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.200-210,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
5.

Conference Proceedings
Conference Proceedings
5. Comparative study of positive chemically amplified photoresist performance for x-ray and DUV lithography
Krasnoperova,A.A. ; Ito,H. ; Breyta,G. ; Fenzel-Alexander,D.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.692-704,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
6.

Conference Proceedings
Conference Proceedings
6. X-ray mask defect repair optimization
Chen,Z. ; Nash,S.C. ; Krasnoperova,A.A. ; Wasik,C.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.448-454,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
7.

Conference Proceedings
Conference Proceedings
7. New application for x-ray lithography:fabrication of blazed diffractive optical elements with a deep-phase profile
Makarov,O.A. ; Chen,Z.G. ; Krasnoperova,A.A. ; Cerrina,F. ; Cherkashin,V.V. ; Poleshchuk,A.G. ; Koronkevich,V.P.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.261-267,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
8.

Conference Proceedings
Conference Proceedings
8. 100-nm gate lithography for double-gate transistors
Krasnoperova,A.A. ; Zhang,Y. ; Babich,I.V. ; Treichler,J. ; Yoon,J.H. ; Guarini,K. ; Solomon,P.M.
Pub. info.: Optical Microlithography XIV.  4346  pp.925-935,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346