1.

Conference Proceedings
Conference Proceedings
1. EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology
Stamm, U. ; Kleinschmidt, J. ; Gabel, K. ; Hergenhan, G. ; Ziener, C. ; Ahmad, I. ; Bolshukhin, D. ; Korobotchko, V. ; Keller, A. ; Geier, A. ; Ringling, J. ; Tran, C. D. ; Mader, B. ; de Bruijn, R. ; Gotze, S. ; Brudermann, J. ; Schriever, G.
Pub. info.: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.236-247,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5751
2.

Conference Proceedings
Conference Proceedings
2. Development status of EUV sources for use in beta-tools and high-volume chip manufacturing tools [6151-24]
Stamm, U. ; Kleinschmidt, J. ; Bolshukhin, D. ; Brudermann, J. ; Hergenhan, G. ; Korobotchko, V. ; Nikolaus, B. ; Schrmann M. C. ; Ziener, C. ; Borisov, V. M
Pub. info.: Emerging Lithographic Technologies X.  pp.61510O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
3.

Conference Proceedings
Conference Proceedings
3. High-power EUV lithography sources based on gas discharges and laser-produced plasmas
Stamm, U. ; Ahmad, I. ; Balogh, I. ; Birner, H. ; Bolshukhin, D. ; Brudermann, J. ; Enke, S. ; Flohrer, F. ; Goebel, K. ; Goetze, S. ; Hergenhan, G. ; Kleinschmidt, J. ; Kloepfel, D. ; Korobotchko, V. ; Ringling, J. ; Schriever, G. ; Tran, C.D. ; Ziener, C.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.119-129,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
4.

Conference Proceedings
Conference Proceedings
4. High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma
Stamm, U. ; Ahmad, I. ; Borisov, V.M. ; Flohrer, F. ; Gaebel, K. ; Goetze, S. ; Ivanov, A.S. ; Khristoforov, O,B. ; Kloepfel, D. ; Koehler, P. ; Kleinschmidt, J. ; Korobotchko, V. ; Ringling, J. ; Schriever, G. ; Vinokhodov, A.Y.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.122-133,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
5.

Conference Proceedings
Conference Proceedings
5. Dervelopment of high-power EUV sources for lithography
Borisov, V.M. ; Ahmad, I. ; Goetze, S. ; Ivanov, A.S. ; Khristoforov, O.B. ; Kleinschmidt, J. ; Korobotchko, V. ; Ringling, J. ; Schriever, G. ; Stamm, U. ; Vinokhodov, A.Y.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.626-633,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
6.

Conference Proceedings
Conference Proceedings
6. EUV source power and lifetime: the most critical issues for EUV lithography
Stamm, U. ; Kleinschmidt, J. ; Gaebel, K. ; Birner, H. ; Ahmad, I. ; Bolshukhin, D. ; Brudermann, J. ; Chinh, T.D. ; Flohrer, F. ; Goetze, S. ; Hergenhan, G. ; Kloepfel, D. ; Korobotchko, V. ; Mader, B. ; Mueller, R. ; Ringling, J. ; Schriever, G. ; Ziener, C.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.133-144,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374