1.

Conference Proceedings
Conference Proceedings
1. Defect repair performance using the nanomachining repair technique
Morikawa, Y. ; Kokubo, H. ; Nishiguchi, M. ; Hayashi, N. ; White, R. ; Bozak, R. ; Terrill, L.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.520-527,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography
Morikawa, Y. ; Kokubo, H. ; Noguchi, K. ; Sasaki, S. ; Mohri, H. ; Hoga, M. ; Kanda, N. ; Irie, S. ; Watanabe, K. ; Suganaga, T. ; Itani, T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1137-1145,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Photomask repeater strategy for high-quality and low-cost reticle fabrication
Kyoh, S. ; Inoue, S. ; Ikenaga, O. ; Higaki, T. ; Shigemitsu, F. ; Mori, I. ; Kokubo, H. ; Hayashi, N. ; Irie, N. ; Ishii, Y. ; Umatate, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.16-22,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. PSM quartz etch depth evaluation with an atomic force microscope
Noguchi, K. ; Sasaki, S. ; Yoshida, Y. ; Adachi, T. ; Abe, T. ; Mohri, H. ; Kokubo, H. ; Morikawa, Y. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.407-414,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
5.

Conference Proceedings
Conference Proceedings
5. Feasibility study of manufacturing process and quality control for the new alternatingPSM structure (BACUS Best Poster)
Morikawa, Y. ; Kokubo, H. ; Nishiguchi, M. ; Nara, M. ; Totsu, Y. ; Hoga, M. ; Hayashi, N.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.224-234,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764