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12 results

Conference Proceedings

1. Preparation of Ultrathin Oxide Films by Low-Temperature Remote Plasma-Assisted Process

Niimi, H. ; Koh, K. ; Lucovsky, G.

Pub. info.:	Proceedings of the eleventh International Symposium on Plasma Processing. pp.623-630, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-12

Conference Proceedings

2. Controlled Nitrogen Incorporation at Si-SiO2 Interfaces by Re- mote Plasma Assisted Processing

Koh, K. ; Niimi, H. ; Lucovsky, G.

Pub. info.:	Proceedings of the eleventh International Symposium on Plasma Processing. pp.631-638, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-12

Conference Proceedings

3. Liquid Sensor in Multi-Functional Integrated Circuit

Kaneshiro, C. ; Koh, K. ; Yamamura, A. ; Matsumoto, K. ; Hohkawa, K.

Pub. info.:	Microfabricated systems and MEMS VII : proceedings of the international symposium. pp.324-329, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-09

Conference Proceedings

4. Controlled Incorporation of Nitrogen at the Top Surface of Silicon Oxide Gate Dielectrics

Niimi, H. ; Koh, K. ; Lucovsky, G.

Pub. info.:	Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A.. pp.103-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	446

Conference Proceedings

5. Reaction Pathways for Nitrogen Incorporation at Si-SiO2 Interfaces

Koh, K. ; Niimi, H. ; Lucovsky, G.

Pub. info.:	Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A.. pp.267-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	446

Conference Proceedings

6. Process Definition for Obtaining Ultrathin Silicon Oxides Using Full-Wafer Electrical and Optical Measurements

Oberhofer, A. ; Chen, J. ; Koh, K. ; Schrader, M. ; Shah, S. ; Venables, R. ; Young, C. ; Xu, M. ; Kuehn, R. ; Maher, D. ; Venables, D.

Pub. info.:	Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.573-, 1999. Warrendale, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	567

Conference Proceedings

7. Hydrogen Assisted Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon Nitride Films

Santos-Filho, P. ; Koh, K. ; Stevens, G. ; Lucovsky, G.

Pub. info.:	Diagnostic techniques for semiconductor materials processing II : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A.. pp.57-, 1996. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	406

Conference Proceedings

8. Hydrogen Release and Si-N Bond-Healing Infrared Study of Rapid Thermal Annealed Amorphous Silicon Nitride Thin Films

Santos-Filho, P. ; Stevens, G. ; Lu, Z. ; Koh, K. ; Lucovsky, G.

Pub. info.:	Thermodynamics and kinetics of phase transformations : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.. pp.345-, 1996. Pittsburgh, Penn.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	398

Conference Proceedings

9. Bonded-H in Gate Dielectrics Deposited by Plasma Assisted Chemical Vapor Deposition and Subjected to Rapid Thermal Annealing

Lucovsky, G. ; Nimi, H. ; Koh, K.

Pub. info.:	Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A.. pp.233-, 1996. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	429

10.

Conference Proceedings

10. Nitrogen at Si-SiO2 Interfaces: Chemical Bonding and Electrical Performance

Lucovsky, G. ; Niimi, H. ; Koh, K. ; Lee, D.R. ; Jing, Z.

Pub. info.:	The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.441-455, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-1

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