1.

Conference Proceedings
Conference Proceedings
1. Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z
Plontke, R. ; Bettin, L. ; Beyer, D. ; Butschke, J. ; Irmscher, M. ; Koepernik, C. ; Leibold, B. ; Vix, A. B. E. ; Voehringer, P.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.188-196,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
2.

Conference Proceedings
Conference Proceedings
2. Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. Extended process window using variable transmission PSM materials for 65 nm and 45 nm node [6283-120]
Koepernik, C. ; Becker, H. ; Brikner, R. ; Buttgereit, U. ; Irmscher, M. ; Nedelmann, L. ; Zibold, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
4.

Conference Proceedings
Conference Proceedings
4. NIL template manufacturing using a variable. shaped e-beam writer and a new pCAR [6151-42]
Irmscher, M. ; Butschke, J. ; Hess, G. ; Koepernik, C. ; Letzkus, F. ; Renno, M. ; Sailer, H. ; Schulz, H. ; Schwersenz, A. ; Thompson, E.
Pub. info.: Emerging Lithographic Technologies X.  pp.615115-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
5.

Conference Proceedings
Conference Proceedings
5. STEAG HamaTech resist coater ASR5000: tool concept and process results
Krauss, C. ; Dietze, U.U. ; Xu, F. ; Koepernik, C. ; Dress, P. ; Voehringer, P. ; Irmscher, M. ; Szekeresch, J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.684-693,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Mask pafferning using chemically amplified resists and the novel STEAG HamaTech blank coater ASR5000
Koepernik, C. ; Beyer, D. ; Dress, P. ; Hoffmann, T. ; Hudek, P. ; Irmscher, M. ; Krauss, C. ; Leibold, B. ; Mueller, D. ; Reuter, C. ; Springer, R. ; Szekeresch, J. ; Voehringer, P.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.725-736,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
7.

Conference Proceedings
Conference Proceedings
7. Process window enhancement for 45-nm node using alterable transmission phase-shifting materials [6349-19]
Becker, H. ; Renno, M. ; Hess, G. ; Buttgereit, U. ; Koepernik, C. ; Nedelmann, L. ; Irmscher, M. ; Birkner, R. ; Zibold, A. ; Scheruebl, T.
Pub. info.: Photomask Technology 2006.  pp.63490J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
8.

Conference Proceedings
Conference Proceedings
8. Comparative evaluation of e-beam sensitive chemically amplifild resists for mask making
Irmscher, M. ; Beyer, D. ; Butschke, J. ; Constantine, C. ; Hoffmann, T. ; Koepernik, C. ; Krauss, C. ; Leibold, B. ; Letzkus, F. ; Mueller, D. ; Springer, R. ; Voehringer, P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.176-187,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
9.

Conference Proceedings
Conference Proceedings
9. Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024
Irmscher, M. ; Beyer, D. ; Butschke, J. ; Hudek, P. ; Koepernik, C. ; Plumhoff, J. ; Rausa, E. ; Sato, M. ; Voehringer, P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.46-57,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
10.

Conference Proceedings
Conference Proceedings
10. 90-nm mask making processes using the positive tone chemically amplified resist FEP171
Butschke, J. ; Beyer, D. ; Constantine, C. ; Dress, P. ; Hudek, P. ; Irmscher, M. ; Koepernik, C. ; Krauss, C. ; Plumhoff, J. ; Voehringer, P.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.344-354,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256