1.

Conference Proceedings
Conference Proceedings
1. High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma
Stamm, U. ; Ahmad, I. ; Borisov, V.M. ; Flohrer, F. ; Gaebel, K. ; Goetze, S. ; Ivanov, A.S. ; Khristoforov, O,B. ; Kloepfel, D. ; Koehler, P. ; Kleinschmidt, J. ; Korobotchko, V. ; Ringling, J. ; Schriever, G. ; Vinokhodov, A.Y.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.122-133,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
2.

Conference Proceedings
Conference Proceedings
2. High-power-gas-discharge- and laser-plasma-based EUV sources
Flohrer, F. ; Gaebel, K. ; Kloepfel, D. ; Koehler, P. ; Ahmad, I. ; Goetze, S. ; Kleinschmidt, J. ; Korobotchko,V. ; Ringling, J. ; Schriever, G. ; Stamm, U.
Pub. info.: Gas and Chemical Lasers and Intense Beam Applications III.  pp.264-270,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4631