1.

Conference Proceedings
Conference Proceedings
1. Precision improvement for the calibration of submicron dimension reference for electron-beam metrology system
O,B. ; Park,B.C. ; Ko,Y.-U.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.560-567,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Computer modeling of charging-induced electron beam deflection in electron beam lithography
Hwu,J.J. ; Ko,Y.-U. ; Joy,D.C.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.239-246,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
3.

Conference Proceedings
Conference Proceedings
3. Influence of various factors on charging effects in linewidth metrology
Ko,Y.-U.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.81-93,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
4.

Conference Proceedings
Conference Proceedings
4. Monte Carlo model of charging in resists in e-beam lithography
Ko,Y.-U. ; Hwu,J.J. ; joy,D.C.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.694-702,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
5.

Conference Proceedings
Conference Proceedings
5. Metrics of resolution and performance for CD-SEMs
Joy,D.C. ; Ko,Y.-U. ; Hwu,J.J.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.108-114,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
6.

Conference Proceedings
Conference Proceedings
6. Linewidth measurement of wafers using SEM and its uncertainty evaluation
Ko,Y.-U. ; Eom,T.-B. ; Kim,K.-H. ; Kim,S.-W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.159-168,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
7.

Conference Proceedings
Conference Proceedings
7. Secondary-electron image profiles using bias voltage technique in deep contact hole
Ko,Y.-U. ; Joy,D.C. ; Sullivan,N.T. ; Mastovich,M.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.37-45,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344