1.

Conference Proceedings
Conference Proceedings
1. Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning [5963-19]
Becker, H. ; Renno, M. ; Hermanns, U. ; Seitz, H. ; Buttgereit, U. ; Knapp, K. ; Hess, G.
Pub. info.: Advances in optical thin films II : 13-15 September 2005, Jena, Germany.  pp.59630J-,  2005.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5963
2.

Conference Proceedings
Conference Proceedings
2. Production challenges of making EUV mask blanks
Seitz, H. ; Sobel, F. ; Renno, M. ; Leutbecher, T. ; Olschewski, N. ; Reichardt, T. ; Walter, R. ; Becker, H. ; Buttgereit, U. ; HeB, G. ; Knapp, K. ; Wies, C. ; Lebert, R.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.244-251,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
3.

Conference Proceedings
Conference Proceedings
3. Catalytic Air Oxidation of Propylene to Acrolein: Modeling Based on Data from an Industrial Fixed-Bed Reactor
Arntz, D. ; Knapp, K. ; Prescher, G. ; Emig, G. ; Hofmann, H.
Pub. info.: Chemical reaction engineering, Boston : developed in advance of the 7th International Symposium on Chemical Reaction Engineering, in Boston, Massachusetts, October 4-6, 1982.  pp.3-,  1982.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 196
4.

Conference Proceedings
Conference Proceedings
4. Production challenges of making an EUV mask blank(Invited Paper)
Aschke, L. ; Becker, H. W. ; Friemel, F. ; Leutbecher, T. ; Olschewski, N. ; Renno, M. ; Ruggeberg, F. ; Schiffler, M. ; Schmidt, F. ; Sobel, F. ; Walter, K. ; Heβ, G. ; Lenzen, F. ; Knapp, K. ; Alkemper, J. ; Hack, H. ; Megges, K. ; Mitra, I. ; Muller, R. ; Nolte, U. ; Schumacher, J. ; Pannhorst, W.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.94-104,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
5.

Conference Proceedings
Conference Proceedings
5. Antireflection solutions for next generation 193-nm binary and phase-shifting masks [5992-18]
Becker, H. ; Renno, M. ; Hermanns, U. ; Seitz, H. ; Buttgereit, U. ; Knapp, K. ; Hess, G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59920I-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. Imaging articular cartilage using second harmonic generation microscopy [6089-61]
Mansfield, J. C. ; Winlove, C. P. ; Knapp, K. ; Matcher, S. J.
Pub. info.: Multiphoton Microscopy in the Biomedical Sciences VI.  pp.60891O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6089
7.

Conference Proceedings
Conference Proceedings
7. Critical enabling properties of CaF2 lens blanks for state-of-the-art lithography tools
Hahn, J. ; Grabosch, G. ; Parthier, L. ; Knapp, K.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.734-741,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
8.

Conference Proceedings
Conference Proceedings
8. Improved materials meeting the demands for EUV substrates
Mitra, I. ; Alkemper, J. ; Nolte, U. ; Engel, A. ; Mueller, R. ; Ritter, S. ; Hack, H. ; Megges, K. ; Kohlmann, H. ; Pannhorst, W. ; Davis, M.J. ; Aschke, L. ; Knapp, K.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.219-226,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
9.

Conference Proceedings
Conference Proceedings
9. High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition
Becker, H.W. ; Sobel, F. ; Aschke, L. ; Renno, M. ; Krieger, J. ; Buttgereit, U. ; HeB, G. ; Lenzen, F. ; Knapp, K. ; Yulin, S.A. ; Feigl, T. ; Kuhlmann, T. ; Kaiser, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.389-399,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
10.

Conference Proceedings
Conference Proceedings
10. Strong improvement of critical parameters of CaF2 lens blanks for 193-nm and 157-nm lithography
Grabosch, G. ; Parthier, L. ; Kruell, P. ; Knapp, K.
Pub. info.: Optical Microlithography XVII.  pp.1781-1786,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377