Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

11 results

Conference Proceedings

1. Review of photoresist-based lens evaluation methods

Kirk,J.P.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.2-8, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Alignment performance versus mark quality

Kirk,J.P. ; Yoon,J.H. ; Wiltshire,T.J.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.496-501, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

3. Measurment of astigmatism in microlithography lenses

Kirk,J.P.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.848-854, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

4. Application of blazed gratings for determination of equivalent primary azimuthal aberrations

Kirk,J.P. ; Progler,C.J.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.70-76, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

5. Pupil illumination: in-situ measurement of partial coherence

Kirk,J.P. ; Progler,C.J.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.281-288, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

6. Characterization of a next-generation step-and-scan system

Wiltshire,T.J. ; Kirk,J.P. ; Wheeler,D.C. ; Obszarny,C. ; Marsh,J.T. ; Odiwo,D.M.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.448-459, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

7. Viability of conventional high-NA KrF imaging for sub-0.25-ｦﾌm lithography

Farrell,T.R. ; Nunes,R. ; Campbell,R. ; Hoh,P. ; Samuels,D.J. ; Kirk,J.P. ; Conley,W.E. ; Iba,J. ; Shibata,T.

Pub. info.:	Optical Microlithography IX. Part1 pp.46-53, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

Conference Proceedings

8. Aberration analysis using reconstructed aerial images of isolated contacts on attenuated phase-shift masks

Zach,F.X. ; Lin,C.Y. ; Kirk,J.P.

Pub. info.:	Optical Microlithography XIV. 4346 pp.1362-1368, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. Aberration measurement using in-situ two-beam interferometry

Kirk,J.P. ; Kunkel,G. ; Wong,A.K.

Pub. info.:	Optical Microlithography XIV. 4346 pp.8-14, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

10.

Conference Proceedings

10. Detection of focus and spherical aberration by use of a phase grating

Kirk,J.P. ; Schank,S. ; Lin,C.Y.

Pub. info.:	Optical Microlithography XIV. 4346 pp.1355-1361, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

11 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by:

Author: Kirk,J.P.