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15 results

Conference Proceedings

1. Current status of ASET-HIT EUV phase-shifting point diffraction interferometer

Gomel,Y. ; Sugisaki,K. ; Zhu,Y. ; Niibe,M. ; Watanabe,T. ; Kinoshita,H.

Pub. info.:	Soft X-ray and EUV imaging systems II : 31 July-1 August 2001, San Diego, USA. pp.39-45, 2001. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4506

Conference Proceedings

2. Progress in the development of three-aspherical mirror optics for EUVL

Kinoshita,H. ; Watanabe,T. ; Bajuk,D.J. ; Daniel,J. ; Kimpara,Y. ; Kriese,M.D. ; Platonov,Y.Y.

Pub. info.:	EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado. pp.164-171, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3767

Conference Proceedings

3. Design of imaging system for EUVL

Kinoshita,H. ; Watanabe,T. ; Koike,M. ; Namioka,T.

Pub. info.:	Materials, manufacturing, and measurement for synchrotron radiation mirrors : 30-31 July 1997, San Diego, California. pp.211-220, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3152

Conference Proceedings

4. Three-aspherical-mirror system for EUV lithography (Invited Paper)

Kinoshita,H. ; Watanabe,T. ; Niibe,M. ; Ito,M. ; Oizumi,H. ; Yamanashi,H. ; Murakami,K. ; Oshino,T. ; Platonov,Y.Y. ; Grupido,N.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.20-31, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

5. Development for the alignment procedure of three-aspherical-mirror optics

Irie,S. ; Watanabe,T. ; Kinoshita,H. ; Miyafuji,A. ; Sugisaki,K. ; Oshino,T. ; Murakami,K.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.807-813, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

6. Design of EUVL camera with large numerical aperture

Li,Y. ; Watanabe,T. ; Kinoshita,H.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.759-764, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

7. Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography

Sugisaki,K. ; Oshino,T. ; Murakami,K. ; Watanabe,T. ; Kinoshita,H. ; Miyafuji,A. ; Irie,S. ; Shirayone,S.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.751-758, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

8. Present status of the ASET at-wavelength phase-shifting polnt diffraction interferometer

Sugisaki,K. ; Zhu,Y. ; Gomei,Y. ; Niibe,M. ; Watanabe,T. ; Kinoshita,H.

Pub. info.:	Soft X-ray and EUV imaging systems : 3-4 August 2000, San Diego, USA. pp.47-53, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4146

Conference Proceedings

9. Recent advances of three-aspherical-mirror system for EUVI

Kinoshita,H. ; Watanabe,T. ; Li,Y. ; Miyafuji,A. ; Oshino,T. ; Sugisaki,K. ; Murakami,K. ; Irie,S. ; Shirayone,S. ; Okazaki,S.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.70-75, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

10.

Conference Proceedings

10. Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithograph

Watanabe,T. ; Kinoshita,H. ; Miyafuji,A. ; Irie,S. ; Shirayone,S. ; Mori,S. ; Yano,E. ; Hada,H. ; Ohmori,K. ; Komano,H.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.600-607, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

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Author: Kinoshita,H.