1.

Conference Proceedings
Conference Proceedings
1. Progress in qualifying and quantifying the airborne base sensitivity of modern chemically amplified DUV photoresists
Kinkead,D.A. ; Ercken,M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.750-758,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Prevention of optics and resist contamination in 300-mm lithography: improvements in chemical air filtration
Kinkead,D.A. ; Grayfer,A. ; Kishkovich,O.P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.739-752,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344